公开(公告)号：US20140322852A1

公开(公告)日：2014-10-30

申请号：US14074629

申请日：2013-11-07

Applicant: Samsung Display Co., Ltd.

Inventor： Sung-Joong JOO ,  You-Min CHA ,  Seuk-Hwan PARK

IPC: H01L51/00

CPC classification number: C23C14/568 ,  C23C14/50 ,  H01L51/0011 ,  H01L51/56

Abstract: A deposition apparatus includes a deposition chamber, a plurality of substrate holders comprising a first holder configured to maintain a substrate at a first substrate position in the deposition chamber and a second holder configured to maintain another substrate at a second substrate position in the deposition chamber, a deposition source disposed in the deposition chamber and configured to supply a deposition material to apply onto substrates placed at the first and second substrate positions, and a deposition source transfer mechanism configured to move the deposition source to be opposite to one of the first and second substrates in a first direction, a substrate transfer mechanism configured to transfer a substrate in a second direction to or from the first substrate position and further configured to transfer another substrate in the second direction to or from the second substrate position.

Abstract translation: 沉积设备包括沉积室，多个衬底保持器，其包括构造成将衬底保持在沉积室中的第一衬底位置处的第一保持器和构造成将另一衬底保持在沉积室中的第二衬底位置处的第二保持器， 沉积源，设置在所述沉积室中并且被配置为提供沉积材料以施加到放置在所述第一和第二基板位置的基板上;沉积源传输机构，被配置为使所述沉积源移动以与所述第一和第二基板位置之一相反 衬底传送机构，其被配置为将衬底沿第二方向传送到第一衬底位置或从第一衬底位置移动，并且还被配置为将第二方向上的另一个衬底转移到第二衬底位置或从第二衬底位置传送另一个衬底。