公开(公告)号：US09054342B2

公开(公告)日：2015-06-09

申请号：US14029296

申请日：2013-09-17

Applicant: Samsung Display Co., Ltd.

Inventor： Yoshiaki Sakamoto ,  Nam Ha

IPC: H01L21/4763 ,  H01L51/56

CPC classification number: H01L51/56 ,  H01J37/32779 ,  H01J2237/334 ,  H01L21/67173 ,  H01L21/6776 ,  H01L51/0017

Abstract: Provided are an apparatus and method for etching an organic layer, in which an organic material deposited in a non-layer forming area of a substrate is etched. The apparatus includes an etching chamber; a plasma generator configured to supply plasma into the etching chamber; a stage disposed in the etching chamber and configured to support the substrate; and a mask configured to guide the plasma toward the non-pixel area.

Abstract translation: 提供了蚀刻有机层的装置和方法，其中沉积在衬底的非层形成区域中的有机材料被蚀刻。 该设备包括蚀刻室; 等离子体发生器，其被配置为将等离子体供应到所述蚀刻室中; 设置在所述蚀刻室中并被配置为支撑所述基板的台; 以及被配置为将等离子体引向非像素区域的掩模。