-
公开(公告)号:US20250098431A1
公开(公告)日:2025-03-20
申请号:US18742773
申请日:2024-06-13
Applicant: Samsung Display Co., Ltd.
Inventor: WONKYU CHOE , YOONSEOK KA , SEHUN KIM , KYONGSUB KIM , Jaeyoul KIM
IPC: H10K59/122 , H10K59/12 , H10K59/38 , H10K59/80
Abstract: A display device is provided to include a base layer in which a pixel region and a peripheral region adjacent to the pixel region are defined, a pixel defining film which is provided on the base layer and in which a light emitting opening corresponding to the pixel region is defined, a light emitting element which is provided in the light emitting opening and generates first color light, and an encapsulation layer provided on the light emitting element, wherein the encapsulation layer includes a first inorganic encapsulation layer provided on the light emitting element, a polymer layer which is provided on the first inorganic encapsulation layer and includes a base resin and an organic acid derivative, an organic encapsulation layer provided on the polymer layer, and a second inorganic encapsulation layer provided on the organic encapsulation layer.
-
公开(公告)号:US20250089545A1
公开(公告)日:2025-03-13
申请号:US18639800
申请日:2024-04-18
Applicant: Samsung Display Co., Ltd.
Inventor: WONKYU CHOE , DUCKJUNG LEE
IPC: H10K71/20 , H10K59/12 , H10K59/122 , H10K71/15 , H10K71/60
Abstract: The method for manufacturing a display device according to one or more embodiments of the present disclosure may include preparing a substrate including a display area, a pad area, a peripheral area, a first electrode, and an intermediate layer, the first electrode and the intermediate layer being in the display area, forming a preliminary first lift-off layer on the substrate, forming a first photoresist pattern on the preliminary first lift-off layer, having a photo-opening part overlapping with the display area, etching the preliminary first lift-off layer to form a first lift-off layer exposing the display area, forming a second electrode on the intermediate layer through the photo opening part, and removing the first lift-off layer and the first photoresist pattern.
-