公开(公告)号：US20140326399A1

公开(公告)日：2014-11-06

申请号：US13963977

申请日：2013-08-09

Applicant: Samsung Display Co., Ltd.

Inventor： Tae Min KANG

IPC: H01L51/00 ,  H01L51/50

CPC classification number: H01L51/0013 ,  B41J2/32 ,  H01L27/3246 ,  H01L51/5012 ,  H01L51/56 ,  Y10T156/10 ,  Y10T156/1705 ,  Y10T156/1744

Abstract: A laser induced thermal imaging apparatus comprises a substrate support configured to support a substrate, a donor film holder configured to hold a donor film at a position over the substrate support, and a press unit comprising a first elastic member and a second elastic member disposed over the substrate support. The press unit is configured to move the first and second elastic members in a pressing direction toward the substrate support for pressing the donor film to the substrate to laminate the donor film onto the substrate. The second elastic member surrounds the first elastic member when viewed in the pressing direction and is more rigid than the first elastic member.

Abstract translation: 激光感应热成像设备包括被配置为支撑衬底的衬底支撑件，被配置为将施主膜保持在衬底支撑件上方的位置处的施主膜保持器，以及压力单元，包括第一弹性构件和设置在第二弹性构件上的第二弹性构件 衬底支撑。 按压单元构造成使第一和第二弹性构件朝向基板支撑件按压方向移动，以将供体膜压向基板，以将施主膜层压到基板上。 当沿按压方向观察时，第二弹性构件围绕第一弹性构件，并且比第一弹性构件更刚性。

公开(公告)号：US20160248011A1

公开(公告)日：2016-08-25

申请号：US14855890

申请日：2015-09-16

Applicant: Samsung Display Co., Ltd.

Inventor： Tae Min KANG ,  Young Suk Cho

IPC: H01L51/00 ,  H01L51/56

CPC classification number: H01L51/0002 ,  C23C14/042 ,  H01L51/0011 ,  H01L51/5012 ,  H01L51/56

Abstract: A method of manufacturing a mask includes aligning a mask substrate comprising a thin film at a processing position, forming a coating layer comprising a cleaning solution material on a first surface of the mask substrate, forming a deposition pattern on a second surface of the mask substrate, and removing the coating layer from the mask substrate comprising the deposition pattern.

Abstract translation: 制造掩模的方法包括：在处理位置对准包括薄膜的掩模基板，在掩模基板的第一表面上形成包括清洗溶液材料的涂层，在掩模基板的第二表面上形成沉积图案 并且从包括沉积图案的掩模基板去除涂层。

公开(公告)号：US20160245745A1

公开(公告)日：2016-08-25

申请号：US14860888

申请日：2015-09-22

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Tae Min KANG ,  Seung Mook LEE ,  Young Suk CHO

IPC: G01N21/53 ,  G01F1/00

CPC classification number: G01N21/53 ,  C23C14/544 ,  G01F1/00

Abstract: An apparatus for measuring a deposition rate includes a light source unit in a deposition region between a deposition source and a substrate in a vacuum chamber, the light source unit emits a monochromatic light toward a deposition material released from the deposition source, a photosensor unit that measures at least one of light absorption, scattering, and emission in the deposition region when light emitted from the light source unit passes through the deposition region, and a multi-pass forming unit defining a multi-pass path between the light source unit and the photosensor unit.

Abstract translation: 一种用于测量沉积速率的装置包括在真空室中的沉积源和衬底之间的沉积区域中的光源单元，光源单元向从沉积源释放的沉积材料发射单色光，光电传感器单元， 当从光源单元发射的光通过沉积区域时，测量沉积区域中的光吸收，散射和发射中的至少一种;以及多通道形成单元，其限定光源单元和光源单元之间的多通路径 光传感器单元。

公开(公告)号：US20160215380A1

公开(公告)日：2016-07-28

申请号：US14929444

申请日：2015-11-02

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Young Suk CHO ,  Tae Min KANG

IPC: C23C14/00 ,  G02B5/10 ,  G02B5/02

CPC classification number: G02B5/10 ,  G02B5/0278 ,  G02B5/0284 ,  G03F7/0007 ,  G03F7/2008 ,  G03F7/70

Abstract: An apparatus for forming an optical pattern includes a vacuum chamber, a mount on which a substrate to be prepared using a mask is to be supported, a diffusion unit adjacent the mask, spaced apart from the mask by a preset interval, and facing the mask, the diffusion unit to diffuse light incident thereon as uniform surface light and transmit the uniform surface light to the mask, and a light source unit spaced in a lateral direction from the diffusion unit, the light source unit to generate light to be incident on the diffusion unit.

Abstract translation: 一种用于形成光学图案的装置包括：真空室，要被支撑要使用掩模制备的基板的安装座，与该掩模相邻的扩散单元，与掩模间隔预定间隔，并面对掩模 所述漫射单元将入射到其上的光作为均匀的表面光漫射并将均匀的表面光透射到所述掩模，以及光源单元，其沿与所述漫射单元相反的横向隔开，所述光源单元产生入射到所述光源的光源单元 扩散单元

公开(公告)号：US20140335445A1

公开(公告)日：2014-11-13

申请号：US14023765

申请日：2013-09-11

Applicant: Samsung Display Co., Ltd.

Inventor： Tae Min KANG

IPC: G03F1/68

CPC classification number: G03F1/68

Abstract: A method of manufacturing a mask includes: providing a base substrate including light-absorbing layer patterns on a first surface thereof; providing a reflective layer on the light-absorbing layer patterns and the first surface of the base substrate; and providing reflective patterns by partially removing the reflective layer. The providing the reflective patterns includes removing the light-absorbing layer patterns and a portion of the reflective layer, by irradiating the light-absorbing layer patterns with laser light.

Abstract translation: 制造掩模的方法包括：在其第一表面上提供包括光吸收层图案的基底基板; 在所述光吸收层图案和所述基底基板的第一表面上设置反射层; 以及通过部分去除反射层来提供反射图案。 提供反射图案包括通过用激光照射光吸收层图案来去除光吸收层图案和反射层的一部分。