Electrostatic chuck
    1.
    发明授权

    公开(公告)号:US09824910B2

    公开(公告)日:2017-11-21

    申请号:US14740799

    申请日:2015-06-16

    CPC classification number: H01L21/6833 Y10T279/23

    Abstract: An electrostatic chuck is disclosed. In one aspect, the electrostatic chuck includes a top plate, wherein first and second regions adjacent to each other are formed at a surface of the top plate. The electrostatic chuck also includes a first absorption plate positioned at the first region and a second absorption plate positioned at the second region to be separated from the first absorption plate. The first and second absorption plates are configured to support the absorption target.

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