公开(公告)号：US09643215B2

公开(公告)日：2017-05-09

申请号：US13963743

申请日：2013-08-09

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Jun Lee ,  Jung-Hwa You ,  Sohra Hahn ,  Dong-Myung Shin

IPC: B08B1/02 ,  B08B1/04 ,  B08B3/04 ,  H01L21/677 ,  H01L21/67 ,  B08B1/00

CPC classification number: B08B1/02 ,  B08B1/002 ,  B08B1/04 ,  B08B3/041 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/67706 ,  H01L21/6776

Abstract: A substrate cleaning apparatus is provided. The substrate cleaning apparatus includes a plurality of transfer rollers for transferring a substrate; a liquid chemical feeder supplying a liquid chemical to a first surface of the substrate; wherein the liquid chemical feeder comprises a first housing and a first cleaning roller rotatably installed within the housing and having an upper portion configured to contact with the substrate.

公开(公告)号：US20140075690A1

公开(公告)日：2014-03-20

申请号：US13963743

申请日：2013-08-09

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Jun Lee ,  Jung-Hwa You ,  Sohra Hahn ,  Dong-Myung Shin

IPC: B08B1/02 ,  B08B1/04 ,  B08B3/04 ,  B08B1/00

CPC classification number: B08B1/02 ,  B08B1/002 ,  B08B1/04 ,  B08B3/041 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/67706 ,  H01L21/6776

Abstract: A substrate cleaning apparatus is provided. The substrate cleaning apparatus includes a plurality of transfer rollers for transferring a substrate; a liquid chemical feeder supplying a liquid chemical to a first surface of the substrate; wherein the liquid chemical feeder comprises a first housing and a first cleaning roller rotatably installed within the housing and having an upper portion configured to contact with the substrate.

Abstract translation: 提供了基板清洗装置。 基板清洗装置包括用于转印基板的多个转印辊; 向所述基板的第一表面供给液体化学品的液体化学品供给装置; 其中所述液体化学进料器包括第一壳体和第一清洁辊，所述第一壳体和所述第一清洁辊可旋转地安装在所述壳体内并且具有被配置为与所述基底