Thin film transistor, method of fabricating the same, and display apparatus having the same
    1.
    发明授权
    Thin film transistor, method of fabricating the same, and display apparatus having the same 有权
    薄膜晶体管,其制造方法以及具有该薄膜晶体管的显示装置

    公开(公告)号:US09035296B2

    公开(公告)日:2015-05-19

    申请号:US13893817

    申请日:2013-05-14

    CPC classification number: H01L29/78621 H01L29/7869

    Abstract: A thin film transistor includes a semiconductor layer disposed on a base substrate and including an oxide semiconductor material, a source electrode and a drain electrode, which respectively extend from opposing ends of the semiconductor layer, a plurality of low carrier concentration areas respectively disposed between the source electrode and the semiconductor layer and between the drain electrode and the semiconductor layer, a gate insulating layer disposed on the semiconductor layer, and a gate electrode disposed on the gate insulating layer.

    Abstract translation: 薄膜晶体管包括设置在基底基板上的半导体层,其包括分别从半导体层的相对端延伸的氧化物半导体材料,源电极和漏电极,分别设置在半导体层之间的多个低载流子浓度区域 源电极和半导体层之间以及在漏极和半导体层之间,设置在半导体层上的栅极绝缘层和设置在栅极绝缘层上的栅电极。

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