Mask assembly for deposition, deposition apparatus, and method employing the same
    2.
    发明授权
    Mask assembly for deposition, deposition apparatus, and method employing the same 有权
    用于沉积的掩模组件,沉积装置和使用其的方法

    公开(公告)号:US09530961B2

    公开(公告)日:2016-12-27

    申请号:US14697925

    申请日:2015-04-28

    CPC classification number: H01L51/0002 C23C14/042 H01L51/0011 H01L51/56

    Abstract: Disclosed is a mask assembly for deposition including: a frame having an opening; a mask having at least one pattern part formed in a second direction that is different from a first direction, wherein at least a portion of the mask is supported by the frame and the at least one pattern part has one or more slits continuously formed in the first direction; and at least one support stick extending in the second direction across the opening so as to support at least a portion of the mask.

    Abstract translation: 公开了一种用于沉积的掩模组件,包括:具有开口的框架; 具有沿与第一方向不同的第二方向形成的至少一个图案部的掩模,其中,所述掩模的至少一部分由所述框架支撑,所述至少一个图案部具有连续形成在所述第一方向上的一个或多个狭缝 第一方向 以及至少一个支撑杆,沿着所述第二方向延伸穿过所述开口以便支撑所述掩模的至少一部分。

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