公开(公告)号：US11639470B2

公开(公告)日：2023-05-02

申请号：US17388712

申请日：2021-07-29

Applicant: Samsung Display Co., Ltd.

Inventor： Jonghee Park ,  Hyoung Sik Kim ,  O Byoung Kwon ,  Gi-Yong Nam ,  Kyungchan Min ,  Suck Jun Lee ,  Youngmin Kim ,  Jinhyung Kim ,  Donghun Lee ,  Kyu-Hun Lim ,  Dongmin Jang

IPC: C09K13/06 ,  C23F1/44 ,  H01L51/00 ,  C23F1/02

Abstract: An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.

公开(公告)号：US12144193B2

公开(公告)日：2024-11-12

申请号：US17556799

申请日：2021-12-20

Applicant: Samsung Display Co., Ltd.

Inventor： Jong Hee Park ,  Hyoung Sik Kim

IPC: H10K50/813 ,  H10K50/818 ,  H10K59/12 ,  H10K71/00 ,  H10K102/10

Abstract: An embodiment of a display device comprises a base substrate; an anode electrode disposed on the base substrate; a cathode electrode facing the anode electrode; and an organic light emitting layer disposed between the anode electrode and the cathode electrode, wherein the anode electrode includes: a first anode electrode disposed between the base substrate and the organic light emitting layer, a second anode electrode disposed between the first anode electrode and the organic light emitting layer, and a third anode electrode disposed between the second anode electrode and the organic light emitting layer, wherein a width of the first anode electrode is equal to or greater than a width of the second anode electrode.

公开(公告)号：US12031076B2

公开(公告)日：2024-07-09

申请号：US18122706

申请日：2023-03-17

Applicant: Samsung Display Co., Ltd.

Inventor： Jonghee Park ,  Hyoung Sik Kim ,  O Byoung Kwon ,  Gi-Yong Nam ,  Kyungchan Min ,  Suck Jun Lee ,  Youngmin Kim ,  Jinhyung Kim ,  Donghun Lee ,  Kyu-Hun Lim ,  Dongmin Jang

IPC: C09K13/06 ,  C23F1/02 ,  C23F1/44 ,  H10K59/12 ,  H10K71/00 ,  H10K71/20

CPC classification number: C09K13/06 ,  C23F1/02 ,  C23F1/44 ,  H10K59/1201 ,  H10K71/233 ,  H10K71/621

Abstract: An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.