专利检索 ap:("Samsung Display Co., Ltd.") AND inv:"Eunae KWAK" 第 1 页

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发明申请
PHOTOCURABLE COMPOSITION FOR PATTERN FORMATION AND PATTERNED BODY MANUFACTURED BY USING THE COMPOSITION 审中-公开

公开(公告)号：US20180305487A1

公开(公告)日：2018-10-25

申请号：US15870145

申请日：2018-01-12

申请人： Samsung Display Co., Ltd.

发明人： Sanghee YU , Jaehong PARK , Jiyun PARK , Hyungguen YOON , Kyunghee LEE , Kyungseon TAK , Minhyuck KANG , Eunae KWAK , Hoilim KIM

IPC分类号： C08F220/68

CPC分类号： C08F220/68

摘要： An exemplary embodiment of the application discloses a photocurable composition for pattern formation includes at least one multifunctional (meth)acrylate; at least one monofunctional (meth)acrylate; a release additive; and a photoinitiator, wherein the release additive includes a fluorine-based monomer and a silicon-based monomer.