MASK QUALITY MANAGEMENT SYSTEM
    1.
    发明申请

    公开(公告)号:US20250093769A1

    公开(公告)日:2025-03-20

    申请号:US18749793

    申请日:2024-06-21

    Abstract: A mask quality management system includes a mask including a mask frame and a plurality of mask sheets, wherein the mask sheets are fixed to an upper surface of the mask frame and disposed to be spaced apart from each other, a stage on which the mask is seated, and a first module disposed on the stage and measuring a sagging degree of the mask sheet from the mask frame by irradiating an intense light to the mask.

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