METHOD AND APPARATUS FOR FORMING SEMICONDUCTOR DEVICE

    公开(公告)号:US20230395449A1

    公开(公告)日:2023-12-07

    申请号:US18328795

    申请日:2023-06-05

    Abstract: A method for forming a semiconductor device is provided. The method include: providing a package including: a substrate; a stress absorbing layer disposed on a top surface of the substrate; an electronic component mounted on the top surface of substrate; and a first contact pad disposed on the top surface of the substrate and exposed from the stress absorbing layer; providing a mold including: a first cavity exposed from a bottom surface of the mold; and a recess formed adjacent to the first cavity; engaging the mold and the package with the first cavity over the electronic component and the recess between the electronic component and the first contact pad; and injecting encapsulation material into the first cavity to form an encapsulant over the electronic component.

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