公开(公告)号：US20140179118A1

公开(公告)日：2014-06-26

申请号：US13843594

申请日：2013-03-15

申请人： SK HYNIX INC.

发明人： Sung-Hyuk CHO ,  Hyo-Sang KANG ,  Sung-Ki PARK ,  Kwon HONG ,  Hyung-Soon PARK ,  Hyung-Hwan KIM ,  Young-Bang LEE ,  Ji-Hye HAN ,  Tae-Yeon JUNG ,  Hyeong-Jin NOR

IPC分类号： H01L21/02

CPC分类号： H01L21/0206 ,  H01L21/02068 ,  H01L21/321 ,  H01L27/10852 ,  H01L28/90

摘要： A surface treatment method for a semiconductor device includes providing a substrate where a plurality of projected patterns are formed, forming a hydrophobic coating layer on a surface of each of the plurality of projected patterns, rinsing the substrate with deionized water, and drying the substrate, wherein the hydrophobic coating layer is formed using a coating agent that includes phosphate having more than one hydrocarbon group, phosphonate having more than one hydrocarbon group, or a mixture thereof.

摘要翻译： 用于半导体器件的表面处理方法包括提供形成多个突出图案的基板，在多个突出图案的每一个的表面上形成疏水涂层，用去离子水冲洗基板，并干燥基板， 其中所述疏水涂层使用包括具有多于一个烃基的磷酸酯，具有多于一个烃基的膦酸酯或其混合物的包衣剂形成。

公开(公告)号：US20160172433A1

公开(公告)日：2016-06-16

申请号：US15048620

申请日：2016-02-19

申请人： SK hynix Inc.

发明人： Sung-Hyuk CHO ,  Hyo-Sang KANG ,  Sung-Ki PARK ,  Kwon HONG ,  Hyung-Soon PARK ,  Hyung-Hwan KIM ,  Young-Bang LEE ,  Ji-Hye HAN ,  Tae-Yeon JUNG ,  Hyeong-Jin NOR

IPC分类号： H01L49/02 ,  H01L27/108 ,  H01L21/311 ,  H01L21/02 ,  H01L21/321

CPC分类号： H01L28/60 ,  H01L21/0206 ,  H01L21/02068 ,  H01L21/31111 ,  H01L21/321 ,  H01L27/1085 ,  H01L27/10852 ,  H01L28/90

摘要： A surface treatment method for a semiconductor device includes providing a substrate where a plurality of projected patterns are formed, forming a hydrophobic coating layer on a surface of each of the plurality of projected patterns, rinsing the substrate with deionized water, and drying the substrate, wherein the hydrophobic coating layer is formed using a coating agent that includes phosphate having more than one hydrocarbon group, phosphonate having more than one hydrocarbon group, or a mixture thereof.

摘要翻译： 用于半导体器件的表面处理方法包括提供形成多个突出图案的基板，在多个突出图案的每一个的表面上形成疏水涂层，用去离子水冲洗基板，并干燥基板， 其中所述疏水涂层使用包括具有多于一个烃基的磷酸酯，具有多于一个烃基的膦酸酯或其混合物的包衣剂形成。