MASS SPECTROMETER AND METHOD FOR SETTING ANALYSIS CONDITION

    公开(公告)号:US20240145223A1

    公开(公告)日:2024-05-02

    申请号:US18383919

    申请日:2023-10-26

    IPC分类号: H01J49/00 H01J49/10

    CPC分类号: H01J49/0036 H01J49/105

    摘要: An ICP-MS includes a control device, a collision cell and a first electrode that are provided on an optical axis of plasma, and a second electrode, a mass separation device, and a detector that are provided on a detection axis. The control device sets, as an axis-shifting voltage to be applied to each electrode of the first electrode and the second electrode in a gas-present mode, the voltage obtained by adding an offset determined according to a mass-to-charge ratio of a target ion to an initial voltage in a gasless mode.

    MASS SPECTROMETER
    2.
    发明申请
    MASS SPECTROMETER 审中-公开

    公开(公告)号:US20190006162A1

    公开(公告)日:2019-01-03

    申请号:US15777409

    申请日:2015-11-20

    IPC分类号: H01J49/04

    摘要: A mass spectrometer 10 includes: an insertion port 1 through which a sample plate 8 is to be inserted; a reading device 6 including: a light emitter 61 disposed to emit light in such a manner that the light falls onto the sample plate 8 inserted through the insertion port 1; and a light receiver 62 for receiving reflected by or transmitted through the sample plate 8 to read an identifier 80 provided on the sample plate 8; an analyzer 101 for performing a mass spectrometric analysis on a sample 9 placed on the sample plate 8, to obtain analysis information of the sample 9; and a storage section 51 for storing identification information 800 of the sample plate 8 and the analysis information 100 of the sample 9 placed on the sample plate 8, which are associated with each other, the identification information 800 being indicated by the identifier 80 read by the reading device 6, and the analysis information 100 being obtained by the analyzer 101.

    HIGH-FREQUENCY POWER SUPPLY FOR PLASMA AND ICP OPTICAL EMISSION SPECTROMETER USING THE SAME
    3.
    发明申请
    HIGH-FREQUENCY POWER SUPPLY FOR PLASMA AND ICP OPTICAL EMISSION SPECTROMETER USING THE SAME 有权
    用于等离子体的高频电源和使用其的ICP光电发射光谱仪

    公开(公告)号:US20140071448A1

    公开(公告)日:2014-03-13

    申请号:US14017155

    申请日:2013-09-03

    IPC分类号: H05H1/28 G01N21/73

    摘要: In a high-frequency power supply for plasma having a housing and a high-frequency circuit substrate placed inside the housing, elements for supplying a high-frequency current to a high-frequency inductive coil are mounted on the high-frequency circuit substrate , a cooling block for cooling the high-frequency circuit substrate is provided, and a coolant path a for allowing a coolant to flow through is formed inside the cooling block so that the coolant is allowed to flow through the coolant path when a high-frequency current is supplied and the coolant is not allowed to flow through the coolant path when a high-frequency current is not supplied.

    摘要翻译: 在具有放置在壳体内部的壳体和高频电路基板的等离子体用高频电源中,用于向高频电感线圈供给高频电流的元件安装在高频电路基板上, 提供用于冷却高频电路基板的冷却块,并且在冷却块内部形成有用于允许冷却剂流过的冷却剂通路a,使得当高频电流为高频电流时冷却剂流过冷却剂通道 当不提供高频电流时,不允许冷却剂流过冷却剂通道。

    MASS SPECTROMETER
    4.
    发明公开
    MASS SPECTROMETER 审中-公开

    公开(公告)号:US20240145225A1

    公开(公告)日:2024-05-02

    申请号:US18382955

    申请日:2023-10-23

    IPC分类号: H01J49/04 H01J49/10 H01J49/24

    摘要: Provided is a mass spectrometer including a vacuum chamber containing a cell used for causing ions originating from a sample to come in contact with a predetermined gas supplied from a gas supplier (20), which includes a three-way valve (204) configured to selectively send the gas into either a first passage (22) for sending the predetermined gas to the cell or a second passage (23) for discharging the gas into vacuum state. The mass spectrometer also includes a controller configured to control the three-way valve so as to send the gas into the second passage during an analysis period in which ions are not caused to come in contact with the gas within the cell and/or during a non-analyzing period, as well as to send the gas into the first passage during an analysis period in which ions are caused to come in contact with the gas within the cell.

    VACUUM PROCESSING DEVICE AND MASS ANALYZING DEVICE

    公开(公告)号:US20190066990A1

    公开(公告)日:2019-02-28

    申请号:US15777368

    申请日:2015-11-20

    IPC分类号: H01J49/04 H01J49/16

    摘要: A vacuum processing apparatus 100 includes: a vacuum chamber 1; a stage 2 placed inside the vacuum chamber 1, on which an object to be processed is placed; an internal guide rail 31 laid in the vacuum chamber 1 to guide the stage 2; a through-hole 103 made in a sidewall 102 of the vacuum chamber 1; a connecting rod 4 coupled to the stage 2 at one end and inserted in the through-hole 103, the other end being disposed outside the vacuum chamber 1; a movable member 5 connected to the other end of the connecting rod 4; a driving mechanism 8 disposed outside the vacuum chamber 1 to move the movable member 5; and a bellows 6 disposed between the movable member 5 and the sidewall 102, the bellows 6 following the movement of the movable member 5 while maintaining airtightness of the vacuum chamber 1.

    HIGH-FREQUENCY POWER SUPPLY FOR PLASMA AND ICP OPTICAL EMISSION SPECTROMETER USING THE SAME
    6.
    发明申请
    HIGH-FREQUENCY POWER SUPPLY FOR PLASMA AND ICP OPTICAL EMISSION SPECTROMETER USING THE SAME 审中-公开
    用于等离子体的高频电源和使用其的ICP光电发射光谱仪

    公开(公告)号:US20140118735A1

    公开(公告)日:2014-05-01

    申请号:US14017103

    申请日:2013-09-03

    IPC分类号: H05H1/24 G01N21/73

    CPC分类号: H05H1/24 G01N21/73 H05H1/30

    摘要: In a high-frequency power supply for plasma having a housing and a high-frequency circuit substrate placed inside the housing elements for supplying a high-frequency current to a high-frequency inductive coil are mounted on the high-frequency circuit substrate, a cooling block for cooling the high-frequency circuit substrate, a fan for sending air to the elements on the high-frequency circuit substrate as wind are further provided, and fins for allowing air to flow through so that the air is cooled are formed on the surface of the cooling block. The housing is provided with an air path for supplying the air that has flown through the fins to the absorbing side of the fan.

    摘要翻译: 在高频电路基板上安装有用于等离子体的高频电源,其中,壳体和高频电路基板放置在用于向高频感应线圈提供高频电流的外壳元件内部, 用于冷却高频电路基板的块,进一步设置用于将空气送到高频电路基板上的元件作为风的风扇,并且在表面上形成用于允许空气流过以便空气被冷却的翅片 的冷却块。 壳体设置有用于将已经流过翅片的空气供应到风扇的吸收侧的空气路径。

    MASS SPECTROMETER
    7.
    发明公开
    MASS SPECTROMETER 审中-公开

    公开(公告)号:US20240363324A1

    公开(公告)日:2024-10-31

    申请号:US18292897

    申请日:2022-03-15

    IPC分类号: H01J49/10 H01J49/04

    CPC分类号: H01J49/105 H01J49/0422

    摘要: A mass spectrometer includes: a roughing vacuum pump; a turbomolecular pump; a first chamber from which a gas is discharged by the roughing vacuum pump; a second chamber into which hydrogen gas is introduced, the second chamber being located at a stage subsequent to the first chamber; a third chamber provided with a detector, the third chamber being located at a stage subsequent to the second chamber; a gas-discharge tube that forms a gas-discharge flow from the first chamber to the roughing vacuum pump; and a gas-discharge tube that forms a gas-discharge flow from each of the second chamber and the third chamber to the gas-discharge tube by the turbomolecular pump. The mass spectrometer introduces, into the gas-discharge tube, an additional gas having a molecular weight higher than a molecular weight of the hydrogen gas.

    MASS SPECTROMETER
    8.
    发明公开
    MASS SPECTROMETER 审中-公开

    公开(公告)号:US20240274427A1

    公开(公告)日:2024-08-15

    申请号:US18290295

    申请日:2022-03-04

    IPC分类号: H01J49/04 H01J49/24

    CPC分类号: H01J49/0422 H01J49/24

    摘要: A mass spectrometer includes a housing, which has a wall and is provided with a mass spectrometry portion, a base portion, a sampling unit removably attached to the base portion, and an exhaust path for discharging gas derived from a sample. The exhaust path includes a first path provided in the sampling unit, a second path provided in the base portion, and a third path provided in the housing. The base portion has a first base portion fixed to the wall and a second base portion with the second path provided therein. The second base portion is removably fixed to the first base portion.

    FLOW RATE SWITCHING MECHANISM AND MASS SPECTROMETER

    公开(公告)号:US20240128072A1

    公开(公告)日:2024-04-18

    申请号:US18485311

    申请日:2023-10-12

    IPC分类号: H01J49/24 F25B41/42 H01J49/04

    摘要: A flow rate switching mechanism including: a first section including: a first housing with a passage internally bored through, the passage having a narrowed portion at a distance from one end of the passage, and the narrowed portion having a smaller cross-sectional area than the cross-sectional area of the passage at the one end; a capillary having an internal passage having a smaller cross-sectional area than the cross-sectional area of the narrowed portion; and a hermetic support member supporting the capillary and to provide a seal; a second section having a second housing identical in shape to the first housing, without having the capillary and the hermetic support member; and a three-way valve being alternatively switchable between a first state in which the outlet end is connected to the first inlet end and a second state in which the outlet end is connected to the second inlet end.

    VACUUM PROCESSING DEVICE AND MASS ANALYZING DEVICE

    公开(公告)号:US20190033256A1

    公开(公告)日:2019-01-31

    申请号:US15777352

    申请日:2015-11-20

    摘要: A vacuum processing apparatus 1 includes a processing chamber 3 that can bring an inside of the processing chamber into a vacuum state, a load lock chamber 2 that is coupled to the processing chamber 3 and that is switchable between an atmospheric state and the vacuum state, a communication unit 10 configured to communicate the processing chamber 3 and the load lock chamber 2, a stage 5 on which a processing object 9 is placed, the stage being movable between the processing chamber 3 and the load lock chamber 2 through the communication unit 10, and a sealing unit 6 fixed to the stage 5, the sealing unit being larger than an opening 300 of the communication unit 10 on a side of the processing chamber 3.