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公开(公告)号：US11865370B2
公开(公告)日：2024-01-09
申请号：US17305516
申请日：2021-07-09
发明人： Feichao Fu , Xing Xu , Zhou Xue , Johannes Stahl
IPC分类号： A61N5/10
CPC分类号： A61N5/1077 , A61N5/1044 , A61N5/1071 , A61N2005/1074 , A61N2005/1089
摘要： A method may include identifying a time window of a procedure. The method may also include obtaining operational information of the time window. The operational information may include a limit of pulse repetition frequency (PRF) acceleration and a plurality of preliminary radio frequency (RF) PRFs. The method may also include determining a plurality of updated RF PRFs by updating the plurality of preliminary RF PRFs. A rate of variation between any two adjacent updated RF PRFs may be less than or equal to the limit of PRF acceleration. The method may also include causing an RF source to generate electromagnetic waves at the plurality of updated RF PRFs in the time window.
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公开(公告)号：US11984292B2
公开(公告)日：2024-05-14
申请号：US18146438
申请日：2022-12-26
发明人： Cheng Ni , Gang Pan , Zhangfan Deng , Mingyuan Song , Zongrui Sun , Haoshan Zhu , Feichao Fu , Jincheng Mei , Chengjia Yuan , Li Wang , Xiaofeng Zhang , Jianxiong Zou
CPC分类号： H01J1/22 , H01J35/064
摘要： The present disclosure is related to a microwave source. The microwave source may include a cathode heater and a thermionic emitter. The cathode heater may include a first component, and a second component enclosing at least a portion of the first component. The thermionic emitter may be configured to release electrons when the thermionic emitter is heated by the cathode heater. At least a portion of the second component of the cathode heater may be in contact with the thermionic emitter.
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公开(公告)号：US20230215680A1
公开(公告)日：2023-07-06
申请号：US18060494
申请日：2022-11-30
发明人： Shoubo He , Wei Han , Yanfang Liu , Cheng Ni , Feichao Fu , Qi Wang
IPC分类号： H01J35/12
CPC分类号： H01J35/12 , H01J2235/1204 , H01J2235/086 , H01J2235/088
摘要： The present disclosure provides a device and an equipment for radiation ray generation. The device may include: a radiation target assembly configured to generate radiation rays under irradiation of an electron beam with a predetermined energy; and a heat dissipation assembly arranged on a back surface of the radiation target assembly, wherein a range of a thickness of the target assembly may be determined based on a peak of energy deposition of a target material of the radiation target assembly under the irradiation of the electron beam with the predetermined energy.
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