公开(公告)号：US20250105028A1

公开(公告)日：2025-03-27

申请号：US18899185

申请日：2024-09-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hee Jeong PARK ,  Jihyun KIM ,  Yunho KIM ,  Sungjune LEE ,  Donggyu LEE ,  Dongryul LEE ,  Sam-Jong Chol ,  Kuk Nam HAN

IPC: H01L21/67

Abstract: Provided is a chemical liquid purification apparatus for semiconductor manufacturing, the apparatus including a first tank configured to store a chemical liquid, the chemical liquid including impurities, a first line configured to supply the chemical liquid to the first tank, a first electrode and a second electrode included in the first tank, an alternating current waveform generator connected to the first electrode and the second electrode, a second line configured to supply the chemical liquid processed in the first tank to an outside of the first tank, and a filter configured to filter the impurities in the chemical liquid flowing in the second line.

公开(公告)号：US20170131201A1

公开(公告)日：2017-05-11

申请号：US15275555

申请日：2016-09-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yunho KIM ,  Seojeong LIM ,  Sueryeon KIM ,  Jinsung KIM

IPC: G01N21/27 ,  G01N33/18

CPC classification number: G01N21/27 ,  B08B9/283 ,  B08B9/46 ,  G01N21/39 ,  G01N21/85 ,  G01N21/9018 ,  G01N33/18 ,  G01N2201/06113

Abstract: A water inspection apparatus includes an injector, a suction unit, and a water measurement unit. The injector injects a drying gas into a bottle. The suction unit sucks the drying gas from the bottle. The water measurement unit measures the water concentration of the drying gas sucked by the suction unit.