公开(公告)号：US20190131164A1

公开(公告)日：2019-05-02

申请号：US15996848

申请日：2018-06-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byeong Sang KIM ,  Ki Ju SOHN ,  Ju Hyun LEE ,  Dong Wook KIM ,  Kyung Bin PARK ,  Woo Sub SHIM ,  Jung Wook KIM ,  Ho YU ,  Myoung Soo CHOI ,  Eun Soo HWANG

IPC: H01L21/687 ,  H01J37/32 ,  H01L21/67

Abstract: A substrate processing apparatus includes an exhaust unit including a lower surface in which an outlet is formed and four side walls extended from the lower surface, the exhaust unit having exhaust wings protruding from two opposing side walls, a shower head located in the exhaust unit and having distribution holes, and an adjuster disposed on each of side walls of the exhaust unit between the exhaust wings.