公开(公告)号：US20240060916A1

公开(公告)日：2024-02-22

申请号：US18228741

申请日：2023-08-01

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Wonjun YANG ,  Sangho YUN ,  Woojin JUNG ,  Minsu KANG

IPC: G01N23/2251

CPC classification number: G01N23/2251 ,  G01N2223/401 ,  G01N2223/6116

Abstract: Provided is an overlay measuring method including setting an overlay offset on a substrate, obtaining a cell image by irradiating an electron beam, and obtaining a first image of an upper pattern and a second image of a lower pattern, based on the cell image, merging the first image with the second image, and measuring an overlay of the merged image, and correcting a measuring parameter used in measuring the overlay to improve consistency between the overlay offset and a measured result value of the overlay, wherein the measuring parameter is corrected based on a number of measuring failure values classified as a measurement failure in result values of the overlay.