Semiconductor light emitting device and manufacturing method thereof
    2.
    发明授权
    Semiconductor light emitting device and manufacturing method thereof 有权
    半导体发光器件及其制造方法

    公开(公告)号:US09087932B2

    公开(公告)日:2015-07-21

    申请号:US13948797

    申请日:2013-07-23

    IPC分类号: H01L33/00 H01L21/00

    CPC分类号: H01L33/007 H01L33/0079

    摘要: A method for manufacturing a semiconductor light emitting device includes forming an isolation pattern on a semiconductor single crystal growth substrate. A first conductivity-type semiconductor layer, an active layer, and a second conductivity-type semiconductor layer are sequentially grown in one chip unit region of the semiconductor single crystal growth substrate defined by the isolation pattern, and a reflective metal layer is formed to cover the light emitting structure and the isolation pattern. A support substrate is formed on the reflective metal layer, and the semiconductor single crystal growth substrate is removed from the light emitting structure. The support substrate is then cut into individual light emitting devices.

    摘要翻译: 一种制造半导体发光器件的方法包括在半导体单晶生长衬底上形成隔离图案。 在由隔离图案限定的半导体单晶生长基板的一个芯片单元区域中依次生长第一导电型半导体层,有源层和第二导电型半导体层,并且形成反射金属层以覆盖 发光结构和隔离图案。 在反射金属层上形成支撑基板,从发光结构去除半导体单晶生长基板。 然后将支撑衬底切割成单个发光器件。