公开(公告)号：US20240094646A1

公开(公告)日：2024-03-21

申请号：US18368995

申请日：2023-09-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Katsunobu NISHIHARA ,  Nozomi TANAKA ,  Tomoyuki JOHZAKI ,  Ken OZAWA ,  Atsushi SUNAHARA ,  Shinji UEYAMA ,  Shinsuke FUJIOKA ,  Yubo WANG

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70925 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/006

Abstract: An exposure apparatus includes a droplet supplier to supply a target droplet inside a vacuum chamber, an irradiator irradiating a pulsed laser onto the target droplet, a condensing mirror installed inside the vacuum chamber and configured to condense a light emitted from the target droplet by irradiation of the pulsed laser onto the target droplet, a gas supplier to flow a hydrogen gas along a surface of the condensing mirror, a controller to change a supply condition of the target droplet and an irradiation condition of the pulsed laser to conditions different from conditions during an exposure operation to increase an amount of production of hydrogen radicals in the vacuum chamber, and an exhaust pump to exhaust a gas from an inside of the vacuum chamber.