SEMICONDUCTOR MANUFACTURING DEVICE AND SEMICONDUCTOR MANUFACTURING METHOD

    公开(公告)号:US20240272245A1

    公开(公告)日:2024-08-15

    申请号:US18427676

    申请日:2024-01-30

    CPC classification number: G01R33/0325

    Abstract: A semiconductor manufacturing device includes a detection unit that detects an extinction response of a perpendicular magnetic anisotropy PMA film in a sample from a polar Kerr effect signal, and a derivation unit that derives an anisotropic magnetic field (Hk) of the PMA film by extrapolating and fitting the detected extinction response, in magneto-optical Kerr effect measurement that uses a plurality of electromagnets that electrically apply magnetic fields to the sample on the stage by convert a perpendicular magnetic field that includes a vertical component normal to an upper surface of a stage, and a horizontal magnetic field parallel to the upper surface of the stage.

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