公开(公告)号：US20220336206A1

公开(公告)日：2022-10-20

申请号：US17719561

申请日：2022-04-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ga Young SONG ,  Mi Hyun PARK ,  Jong Kyoung PARK ,  Jung Youl LEE ,  Hyun Jin KIM ,  Hyo San Lee ,  Han Sol LIM ,  Hoon HAN

IPC: H01L21/02 ,  C11D3/37 ,  C11D3/20

Abstract: A substrate cleaning composition, a method of cleaning a substrate using the same, and a method of fabricating a semiconductor device using the same, the substrate cleaning composition including a styrene copolymer including a first repeating unit represented by Formula 1-la and a second repeating unit represented by Formula 1-1b; an additive represented by Formula 2-1; and an alcoholic solvent having a solubility of 500 g/L or less in deionized water,