-
公开(公告)号：US20250155790A1
公开(公告)日：2025-05-15
申请号：US18663227
申请日：2024-05-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jimin LIM , Sang-Hyeon LEE , Hoil KI
Abstract: A photomask includes a mask substrate. A reflective layer is disposed on a first surface of the mask substrate. A capping layer is disposed on the reflective layer. An absorber layer pattern is disposed on the capping layer. The absorber layer pattern defines an opening that light sources of extreme ultraviolet wavelengths pass through. A side wall of the absorber layer pattern exposed by the opening includes an inclined surface on an upper portion disposed away from the capping layer and a curved surface on a lower portion adjacent to the capping layer.
Search Results
1
records
(took 0.015 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
