-
1.
公开(公告)号:US20190323893A1
公开(公告)日:2019-10-24
申请号:US16157682
申请日:2018-10-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: SE JIN OH , TAE KYUN KANG , YU SIN KIM , JAE IK KIM , CHAN BIN MO , DOUG YONG SUNG , SEUNG BIN AHN , KUL INN , YUN KWANG JEON
Abstract: A semiconductor substrate measuring apparatus includes a light source unit generating irradiation light including light in a first wavelength band and light in a second wavelength band. An optical unit irradiates the irradiation light on a measurement object and condenses reflected light. A light splitting unit splits the reflected light, condensed in the optical unit, into a first optical path and a second optical path. A first detecting unit is disposed on the first optical path and detects first interference light in the first wavelength band in the reflected light. A second detecting unit is disposed on the second optical path and detects second interference light in the second wavelength band in the reflected light. A controlling unit calculates at least one of a surface shape or a thickness of the measurement object. The controlling unit calculates a temperature of the measurement object.