公开(公告)号：US20240142882A1

公开(公告)日：2024-05-02

申请号：US18382349

申请日：2023-10-20

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Thanh Cuong NGUYEN ,  Jiyoung PARK ,  Jungah Kim ,  Seungmin LEE ,  Inkook JANG

IPC: G03F7/00 ,  G03F7/40

CPC classification number: G03F7/70525 ,  G03F7/40 ,  H01L21/0274

Abstract: A method for discovering a new photoresist dissolvent includes obtaining input data defining a ligand material, estimating a reaction energy of a ligand exchange reaction in which a first ligand of a first complex including a first metal and the first ligand is exchanged with a second ligand, based on the input data, estimating a residual concentration of the first metal corresponding to the reaction energy based on a physical model, and verifying a photoresist dissolvent providing the second ligand based on the residual concentration.