公开(公告)号：US20150241771A1

公开(公告)日：2015-08-27

申请号：US14625954

申请日：2015-02-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Suk-Koo HONG ,  Jong-Chan LEE ,  Su-Jee KWON ,  Dong-Gyun KIM ,  Joon-Je LEE ,  Hyung-Rae LEE

IPC: G03F7/038

CPC classification number: G03F7/0397 ,  G03F7/38

Abstract: A photoresist composition includes a photosensitive copolymer having a repeating unit from a vinyl sulfone monomer, and a solvent.

Abstract translation: 光致抗蚀剂组合物包括具有乙烯基砜单体的重复单元的光敏共聚物和溶剂。

公开(公告)号：US20150118852A1

公开(公告)日：2015-04-30

申请号：US14445185

申请日：2014-07-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyung-Rae LEE ,  Yool KANG ,  Seong-Ji KWON

IPC: H01L21/308 ,  H01L21/027

CPC classification number: H01L21/0273 ,  G03F7/26 ,  G03F7/40 ,  H01L21/3086 ,  H01L21/31144

Abstract: A method of forming a pattern of a semiconductor device includes providing a substrate, forming a photoresist layer by coating a resist composition including an acid generator and a first resin, the first resin having an acid-labile group, exposing the photoresist layer, forming a photoresist pattern by negatively developing the photoresist layer using a developing solution including an organic solvent, coating a capping composition including a second resin and the organic solvent on the substrate having the photoresist pattern formed thereon, and attaching a capping layer on upper and side surfaces of the photoresist pattern, by baking the capping composition and developing the capping composition using the developing solution including the organic solvent.

Abstract translation: 形成半导体器件的图案的方法包括提供基板，通过涂覆包含酸发生剂和第一树脂的抗蚀剂组合物形成光致抗蚀剂层，所述第一树脂具有酸不稳定基团，使光致抗蚀剂层曝光，形成 通过使用包含有机溶剂的显影溶液负性显影光致抗蚀剂层，在其上形成有光致抗蚀剂图案的基材上涂覆包含第二树脂和有机溶剂的封盖组合物，并且在上表面和侧表面上附着覆盖层， 光刻胶图案，通过烘烤封盖组合物并使用包含有机溶剂的显影溶液显影封盖组合物。