公开(公告)号：US20130062310A1

公开(公告)日：2013-03-14

申请号：US13669158

申请日：2012-11-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seok-whan CHUNG ,  Seok-jin KANG ,  Hyun-koo JEONG

IPC: B44C1/22

CPC classification number: B81C1/00396 ,  B81C2201/0198

Abstract: A shadow mask, a method of manufacturing the shadow mask, and a method of forming a thin film using the shadow mask are provided. The shadow mask includes an upper layer and a lower layer. The upper layer includes a first opening. The lower layer is formed on a lower surface of the upper layer around the first opening and includes an opening having the same size as the first opening. When the thin film is formed using the shadow mask, the lower layer of the shadow mask is close to the edge of a cavity of a substrate, and a position on which the thin film may be formed as defined by the lower layer of the shadow mask. Therefore, the thickness of the thin film can be uniform.

Abstract translation: 提供荫罩，荫罩的制造方法以及使用荫罩形成薄膜的方法。 荫罩包括上层和下层。 上层包括第一开口。 下层形成在第一开口周围的上层的下表面上，并且包括具有与第一开口相同尺寸的开口。 当使用荫罩形成薄膜时，荫罩的下层靠近基板的空腔的边缘，并且可以由薄膜的下层限定薄膜的位置 面具。 因此，薄膜的厚度可以是均匀的。