公开(公告)号：US11497109B2

公开(公告)日：2022-11-08

申请号：US17158380

申请日：2021-01-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ho Yu ,  Chae-mook Lim ,  Sung-ho Jang ,  Min-seok Choi

IPC: H05G2/00 ,  G03F7/20 ,  H01S3/223

Abstract: An extreme ultraviolet (EUV) light concentrating apparatus including a main body having a concave inner portion and configured to rotate, a tin generator configured to generate tin drops and spray the tin drops, a tin catcher configured to process the sprayed tin drops, a protective cover configured to block the tin drops from falling into the main body, and a rotation guide configured to rotate the main body may be provided.

公开(公告)号：US10942447B2

公开(公告)日：2021-03-09

申请号：US15869976

申请日：2018-01-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dong-wook Kim ,  Ju-hyun Lee ,  Byeong-sang Kim ,  Kyung-bin Park ,  Ki-ju Sohn ,  Ho Yu

IPC: G03F7/00

Abstract: A film frame, a system for manufacturing a display substrate, and a method of manufacturing a display substrate, the film frame including a pair of frame edges extending lengthwise in a first direction and arranged opposite to each other; a fixed end clamp connected to the pair of frame edges and extending lengthwise in a second direction perpendicular to the first direction; and a free end clamp between the pair of frame edges, the free end clamp extending lengthwise in the second direction and configured to be detachably coupled with the pair of frame edges, wherein the fixed end clamp includes a first magnetic fixer extending lengthwise in the second direction and a second magnetic fixer on the first magnetic fixer, and the free end clamp includes a third magnetic fixer extending lengthwise in the second direction and a fourth magnetic fixer on the third magnetic fixer.

公开(公告)号：US11599031B2

公开(公告)日：2023-03-07

申请号：US17555985

申请日：2021-12-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghyup Kim ,  Ho Yu ,  Jeonggil Kim ,  Minseok Choi

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US11231656B2

公开(公告)日：2022-01-25

申请号：US16835708

申请日：2020-03-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghyup Kim ,  Ho Yu ,  Jeonggil Kim ,  Minseok Choi

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US10946577B2

公开(公告)日：2021-03-16

申请号：US15946790

申请日：2018-04-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho Yu ,  Byeong Sang Kim ,  Jung Wook Kim ,  Kyung Bin Park ,  Ki Ju Sohn ,  Eun Soo Hwang

IPC: B29C59/04 ,  B41L47/46 ,  G03F7/00

Abstract: An imprinting apparatus includes a first frame, a pressure roller rotatably supported on a first end of the first frame, a second frame including a support portion coupled to a second end of the first frame, and at least one guide portion coupled to the support portion to be laterally movable, and at least one load roller supported by the at least one guide portion, the at least one load roller being movable in a vertical direction while being rotatable and contacting a surface of the pressure roller on an upper portion of the pressure roller according to a lateral movement of the guide portion, the at least one load roller to press the pressure roller by force exerted by a load of the at least one load roller.

公开(公告)号：US11852984B2

公开(公告)日：2023-12-26

申请号：US18164835

申请日：2023-02-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghyup Kim ,  Ho Yu ,  Jeonggil Kim ,  Minseok Choi

IPC: G03F7/00 ,  H05G2/00 ,  G21K1/06

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  G03F7/70891 ,  G21K1/06 ,  H05G2/005 ,  H05G2/008

Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US11048179B2

公开(公告)日：2021-06-29

申请号：US16733325

申请日：2020-01-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho Yu ,  Jinhwan Lee ,  Minseok Choi ,  Jeonggil Kim ,  Jongbin Park ,  Inho Choi

IPC: G03F7/20

Abstract: An apparatus for removing residues from a source vessel in an extreme ultraviolet lithography device, the apparatus including a frame portion, and a heater structure on the frame portion, the heater structure having a head on the frame portion, the head being rotatable in at least one shaft direction, and a heater on the head to dissipate heat toward residues in the source vessel, the heater to apply temperature of 200° C. to 800° C.

公开(公告)号：US10647107B2

公开(公告)日：2020-05-12

申请号：US15982146

申请日：2018-05-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho Yu ,  Dong Wook Kim ,  Byeong Sang Kim ,  Kyung Bin Park ,  Ki Ju Sohn ,  Ju Hyun Lee

IPC: B41F23/04 ,  B41M7/00 ,  F26B3/28 ,  B05D3/06

Abstract: An ultraviolet curing apparatus includes a housing, a plurality of ultraviolet light emitting diodes (LEDs) arranged in a length direction of the housing, and at least one shutter part coupled to the housing to be movable in the length direction, to cover at least a portion of the plurality of ultraviolet LEDs to limit an irradiation region of ultraviolet light emitted by the plurality of ultraviolet LEDs.