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1.
公开(公告)号:US20230115351A1
公开(公告)日:2023-04-13
申请号:US17804732
申请日:2022-05-31
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Takashi Sasa , Kyoung Whan Oh , Sang Ho Lee , Seok Heo , Ho Kyun Kim , Ju Hyung Lee
IPC: G03F7/20
Abstract: A photoresist supplying system includes a pump that includes a first tube phragm that stores a photoresist and a filter that filters the photoresist, a second tube phragm that stores the photoresist and is disposed outside the pump, where the second tube phragm transfers the photoresist to the first tube phragm, a storage unit that stores the photoresist, where the storage unit provides the photoresist to the second tube phragm, and a tube phragm drive unit that is connected to the first tube phragm. The tube phragm drive unit adjusts an interior volume of the first tube phragm and applies a pressure to a flexible outer wall of the first tube phragm to transfer the photoresist from the first tube phragm to a nozzle installed in the chamber. At least a part of the photoresist stored in the first tube phragm is transferred to the second tube phragm.
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2.
公开(公告)号:US11733616B2
公开(公告)日:2023-08-22
申请号:US17804732
申请日:2022-05-31
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Takashi Sasa , Kyoung Whan Oh , Sang Ho Lee , Seok Heo , Ho Kyun Kim , Ju Hyung Lee
CPC classification number: G03F7/70908
Abstract: A photoresist supplying system includes a pump that includes a first tube phragm that stores a photoresist and a filter that filters the photoresist, a second tube phragm that stores the photoresist and is disposed outside the pump, where the second tube phragm transfers the photoresist to the first tube phragm, a storage unit that stores the photoresist, where the storage unit provides the photoresist to the second tube phragm, and a tube phragm drive unit that is connected to the first tube phragm. The tube phragm drive unit adjusts an interior volume of the first tube phragm and applies a pressure to a flexible outer wall of the first tube phragm to transfer the photoresist from the first tube phragm to a nozzle installed in the chamber. At least a part of the photoresist stored in the first tube phragm is transferred to the second tube phragm.
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