IMAGE SENSOR AND METHOD OF FABRICATING SAME

    公开(公告)号:US20210193706A1

    公开(公告)日:2021-06-24

    申请号:US16934278

    申请日:2020-07-21

    Abstract: An image sensor includes; a substrate having a first surface and an opposing second surface and including unit pixels respectively having photoelectric conversion regions, a semiconductor pattern disposed in a first trench defining the unit pixels, the semiconductor pattern including a first semiconductor layer provided on an inner surface of the first trench and a second semiconductor layer provided on the first semiconductor layer, and a first contact provided on the second surface and connected to the semiconductor pattern. A height of the first semiconductor layer from a bottom surface of the first trench is less than a height of the second semiconductor layer from the bottom surface of the first trench.

Patent Agency Ranking