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公开(公告)号:US20230392925A1
公开(公告)日:2023-12-07
申请号:US18123788
申请日:2023-03-20
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jiyoung Chu , Hyungjin Kim , Minhwan Seo , Wondon Joo , Dongyoon Koo , Sangwoo Bae , Sungmin Ahn , Jungyu Lee , Yunpyo Hong
CPC classification number: G01B11/272 , G02B27/283 , G02B27/286 , G02B5/0808
Abstract: A method of bonding a die to a wafer using a die bonding system measures, using an obtained image showing interference fringes, a parallelism between the die and the wafer. In some embodiments, parallelism and die deformation are detected using interference fringes produced by an optical apparatus of the die bonding system. A parallelism measurement optical apparatus includes a light source, an optical assembly configured to control polarization of a reference light and a measurement light. In some embodiments, the measurement light is sequentially incident on and reflected from a first measurement surface and a second measurement surface that are spaced apart along a vertical direction to face each other, and is emitted to have information on parallelism between the first and second measurement surfaces. In some embodiments, a first polarizer is configured to interfere the reference light and the measurement light emitted from the optical assembly with each other. A light detector is configured to detect an interference signal of lights including the interference fringes.