公开(公告)号：US11282678B2

公开(公告)日：2022-03-22

申请号：US16535801

申请日：2019-08-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dong-Hyeon Na ,  Seung-Bo Shim ,  Ha-Dong Jin ,  Min-Young Hur ,  Kyo-Hyeok Kim ,  Jong-Woo Sun ,  Jae-Hyun Lee

IPC: H01J37/32 ,  H03H7/38

Abstract: According to a method of controlling uniformity of plasma, a first RF driving pulse signal including first RF pulses is generated by pulsing a first RF signal having a first frequency, and a second RF driving pulse signal including second RF pulses is generated by pulsing a second RF signal having a second, lower frequency. The first and second RF driving signals are applied to a top electrode and/or a bottom electrode of a plasma chamber. A harmonic control signal including harmonic control pulses is generated based on timing of the first and second RF pulses. A harmonic component of the first and second RF driving pulse signals is reduced via intermittent activation and deactivation of a harmonic control circuit as controlled by the harmonic control signal. The uniformity of plasma is improved through the control based on timings of the RF driving pulses.