-
1.
公开(公告)号:US20230187185A1
公开(公告)日:2023-06-15
申请号:US17948943
申请日:2022-09-20
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: SUMIN PARK , SUNGHWAN KIM , HAKYOUNG KIM , DAEHYUN LEE , DONGYUN YEO , MINYOUNG HUR
IPC: H01J37/32
CPC classification number: H01J37/32633 , H01J37/3244 , H01J37/32834 , H01J37/32082 , H01J2237/327
Abstract: A plasma battle includes a lower ring and an upper ring that extends upwardly from an edge of the lower ring. The lower ring includes a lower central hole on a center of the lower ring and vertically penetrating the lower ring and a lower slit outside the lower central hole and vertically penetrating the lower ring. The upper ring includes an upper central hole on a center of the upper ring and vertically penetrating the upper ring and an upper slit that penetrates the upper ring so as to connect an inner lateral surface of the upper ring to an outer lateral surface of the upper ring.