公开(公告)号：US20200012186A1

公开(公告)日：2020-01-09

申请号：US16261105

申请日：2019-01-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sung Min Ahn ,  Sang-Hyun Park ,  Byoung Min Yun ,  Jae Young Jang

IPC: G03F1/36 ,  G03F1/44 ,  G03F1/68 ,  G03F7/20

Abstract: A pattern width correction system includes a pattern width measurement unit configured to measure a width of a first pattern formed at a first distance, where the first pattern is formed by irradiating first light modulated using first pattern data, a first error data calculator configured to generate first error data on the basis of the measured width of the first pattern, a regression analyzer configured to perform regression analysis on the first error data to generate a first relational expression between X-Y coordinates of the first pattern and a width error of the first pattern, a second error data calculator configured to generate second error data in a manipulation area having a second distance by using the first relational expression, and a pattern data correction unit configured to generate second pattern data by correcting the first pattern data on the basis of the second error data.