公开(公告)号：US20240352654A1

公开(公告)日：2024-10-24

申请号：US18647635

申请日：2024-04-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sunghwan HONG ,  Hochae LEE ,  Jungsoo LIM ,  Ansook SUL ,  Yunjoung LEE ,  Yeonkyoung JUNG ,  Donok CHOI

IPC: D06F43/08 ,  D06F43/02 ,  D06L1/00 ,  D06L1/04 ,  D06L1/10

CPC classification number: D06F43/081 ,  D06F43/02 ,  D06L1/00 ,  D06L1/04 ,  D06L1/10

Abstract: Provided is a washing machine including: a storage chamber configured to store carbon dioxide in a gaseous state; an additive container configured to store an additive; a mixing chamber configured to mix the carbon dioxide in the gaseous state supplied from the storage chamber with the additive supplied from the additive container and pressurize the carbon dioxide and the additive, which are mixed with each other, to generate a mixed solution in a liquid state; a washing chamber configured to wash laundry using the mixed solution supplied from the mixing chamber; and a distillation chamber configured to accommodate the mixed solution discharged from the washing chamber and vaporize the carbon dioxide from the mixed solution therein, wherein the additive lowers a vapor pressure of the mixed solution to maintain the mixed solution in a liquid state at pressures of 10 bar or less.

公开(公告)号：US20220344181A1

公开(公告)日：2022-10-27

申请号：US17666796

申请日：2022-02-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Bumjin JANG ,  Seunghwa KANG ,  Sungyong PARK ,  Ansook SUL ,  Kiju SOHN ,  Wonguk SEO

IPC: H01L21/67 ,  H01L21/324

Abstract: A baking apparatus, may include a processing chamber including a lower chamber and an upper chamber connected by a ring shutter; a baking plate in the processing chamber adjacent to a region in which the lower chamber and the ring shutter overlap; an active flow controller including a first module and a second module in the lower chamber adjacent to the baking plate; a first auxiliary flow controller on a lower part of the ring shutter, adjacent to the lower chamber; and a second auxiliary flow controller in the upper chamber adjacent to the ring shutter. The active controller may be configured to move based on movement of the first module in a first direction perpendicular to an upper surface of the baking plate. The active flow controller may be configured to control airflow around the second module by movement of the second module.