公开(公告)号：US20190308276A1

公开(公告)日：2019-10-10

申请号：US16375582

申请日：2019-04-04

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： TOSHINARU SUZUKI ,  DOKYUN KWON ,  JAEBUM PAHK ,  JINWON BAEK ,  JEONGHO YI ,  JINPYUNG LEE ,  KYONGHO HONG

IPC: B23K26/38 ,  H01L21/687 ,  B23K26/70

Abstract: A substrate processing apparatus includes the following: a support frame, first stage, a suction part, and a plurality of island-type second stages. The support frame is disposed on the first stage. The height of the support frame is lower than the height of the first stage. A plurality of island-type second stages are disposed on the support frame on the same plane as the first stage. The suction part is disposed on the support frame.