公开(公告)号：US09841686B2

公开(公告)日：2017-12-12

申请号：US14740743

申请日：2015-06-16

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ik-Han Oh ,  Seung-Kyu Lee ,  Hyeon-Min Cho

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70633 ,  G03F9/7003

Abstract: An exposure method includes exposing a substrate to form a first pattern on a first layer, measuring a first alignment value of the first pattern, generating first correction data by using the first alignment value, storing the first correction data and exposing the substrate to form a second pattern on a second layer disposed on the first layer by using the first correction data.