公开(公告)号：US20070134601A1

公开(公告)日：2007-06-14

申请号：US11652497

申请日：2007-01-12

Applicant: Ryouichirou Naitou ,  Takeshi Shimoaoki

Inventor： Ryouichirou Naitou ,  Takeshi Shimoaoki

IPC: G03C5/00

CPC classification number: G03F7/40 ,  H01L21/67051

Abstract: A rinsing process is performed by supplying a rinsing liquid onto a substrate with a light-exposed pattern formed thereon and treated by a developing process. The rinsing liquid contains a polyethylene glycol family surfactant or an acetylene glycol family surfactant in a critical micelle concentration or less. Preferably, the surfactant includes a hydrophobic group having a carbon number of larger than 11 and having no double bond or triple bond therein.

Abstract translation: 通过在其上形成有曝光图案的基板上提供冲洗液体并通过显影处理来进行冲洗处理。 冲洗液含有聚乙二醇家族表面活性剂或乙炔二醇家族表面活性剂，其临界胶束浓度或更低。 优选地，表面活性剂包括碳数大于11的疏水基团，其中没有双键或三键。

公开(公告)号：US07419773B2

公开(公告)日：2008-09-02

申请号：US11652497

申请日：2007-01-12

Applicant: Ryouichirou Naitou ,  Takeshi Shimoaoki

Inventor： Ryouichirou Naitou ,  Takeshi Shimoaoki

IPC: C03F7/26

CPC classification number: G03F7/40 ,  H01L21/67051

Abstract: A rinsing process is performed by supplying a rinsing liquid onto a substrate with a light-exposed pattern formed thereon and treated by a developing process. The rinsing liquid contains a polyethylene glycol family surfactant or an acetylene glycol family surfactant in a critical micelle concentration or less. Preferably, the surfactant includes a hydrophobic group having a carbon number of larger than 11 and having no double bond or triple bond therein.

Abstract translation: 通过在其上形成有曝光图案的基板上提供冲洗液体并通过显影处理来进行冲洗处理。 冲洗液含有聚乙二醇家族表面活性剂或乙炔二醇家族表面活性剂，其临界胶束浓度或更低。 优选地，表面活性剂包括碳数大于11的疏水基团，其中没有双键或三键。

公开(公告)号：US20090042149A1

公开(公告)日：2009-02-12

申请号：US12219838

申请日：2008-07-29

Applicant: Ryouichirou Naitou ,  Takeshi Shimoaoki

Inventor： Ryouichirou Naitou ,  Takeshi Shimoaoki

IPC: G03F7/20

CPC classification number: G03F7/40 ,  H01L21/67051

Abstract: A rinsing process is performed by supplying a rinsing-liquid onto a substrate with a light-exposed pattern formed thereon and treated by a developing process. The rinsing liquid contains a polyethylene glycol family surfactant or an acetylene glycol family surfactant in a critical micelle concentration or less. Preferably, the surfactant includes a hydrophobic group having a carbon number of larger than 11 and having no double bond or triple bond therein.

Abstract translation: 通过将洗涤液供给到其上形成有曝光图案的基板上并通过显影处理进行冲洗处理。 冲洗液含有聚乙二醇家族表面活性剂或乙炔二醇家族表面活性剂，其临界胶束浓度或更低。 优选地，表面活性剂包括碳数大于11的疏水基团，其中没有双键或三键。