公开(公告)号：US11785571B2

公开(公告)日：2023-10-10

申请号：US17452553

申请日：2021-10-27

Applicant: QUALCOMM Incorporated

Inventor： Mukesh Kumar ,  Guttorm Ringstad Opshaug ,  Pulkit Rajgadiya ,  Fnu Siddhant

IPC: H04W64/00

CPC classification number: H04W64/00

Abstract: A UE receives a first configuration for at least one RRM measurement gap. The UE receives one or more PRSs prior to the at least one RRM measurement gap. The UE identifies whether a processing availability of the UE during the at least one RRM measurement gap is sufficient to process the one or more PRSs. The UE processes the one or more PRSs, where in response to the processing availability of the UE during the at least one RRM measurement gap, the one or more PRSs are processed during the at least one RRM measurement gap; and in response to lack of the processing availability of the UE sufficient to process the one or more PRSs during the at least one RRM measurement gap, the one or more PRSs are processed, at least in part, outside of the at least one RRM measurement gap.