公开(公告)号：US20220205101A1

公开(公告)日：2022-06-30

申请号：US17564387

申请日：2021-12-29

申请人： Piotech Inc.

发明人： Zhenjie Liu ,  Xue Liu ,  Zhi Chai ,  Guangjie Qi

IPC分类号： C23C16/455 ,  B05B1/16 ,  B05B1/00

摘要： Provided is a gas showerhead with controllable airflow distribution, disposed in a cavity of a thin film deposition device and including: a first-layer panel, having a plurality of first gas supply holes distributed according to a first rule; and a second-layer panel, seated on the first-layer panel and having a plurality of second gas supply holes distributed according to a second rule. The first rule is different from the second rule, and one of the first-layer panel and the second-layer panel is capable of rotating at least by a specific angle relative to the other, so that the two panels have a first position and a second position that are different relative to each other. At the first position, none of the first gas supply holes is covered by the second-layer panel; and at the second position, a portion of the first gas supply holes are aligned with the corresponding second gas supply holes, and the other portion of the first gas supply holes are covered by the second-layer panel. The gas showerhead can adjust the airflow distribution and the airflow rate, which helps to meet the spraying requirements of different thin film deposition processes, and improves the uniformity of a deposited thin film.