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公开(公告)号:US20190257984A1
公开(公告)日:2019-08-22
申请号:US16307935
申请日:2017-06-09
Applicant: Alan Jenting SHE , Shuyan ZHANG , Samuel SHIAN , David R. CLARKE , Federico CAPASSO , PRESIDENT AND FELLOWS OF HARVARD COLLEGE
Inventor: Alan Jenting SHE , Shuyan ZHANG , Samuel SHIAN , David R. CLARKE , Federico CAPASSO
Abstract: An electrically-variable optical device includes a planar optical element (POE) and at least one electromechanical layer. The POE includes at least one optical layer. The at least one electromechanical layer is configured to spatially deform the POE to change an optical parameter of the POE. The at least one electromechanical layer may include a dielectric elastomer actuator (DEA) which includes electrodes and an elastomeric spacer between the electrodes. An electric field may be introduced between the electrodes to deform the spacer, which in turn deforms the POE.
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公开(公告)号:US20190025477A1
公开(公告)日:2019-01-24
申请号:US16040363
申请日:2018-07-19
Applicant: PRESIDENT AND FELLOWS OF HARVARD COLLEGE
Inventor: Alan Jenting SHE , Shuyan ZHANG , Federico CAPASSO
Abstract: A method of generating a layout data file for a metasurface device is disclosed. At a radial position of a metasurface device, the method determines a primitive cell of a first level having a metasurface feature pattern that is repeated around an arc corresponding to a circumference at the radial position. The method generates metasurface structures of higher levels. Each metasurface structure of a higher level includes multiple references to a structure or a primitive cell of a next lower level. The method stores at least a portion of a layout of the metasurface device to a layout data file. The layout includes references to metasurface structures of two or more of the higher levels.
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公开(公告)号:US20190025463A1
公开(公告)日:2019-01-24
申请号:US16040488
申请日:2018-07-19
Applicant: PRESIDENT AND FELLOWS OF HARVARD COLLEGE
Inventor: Alan Jenting SHE , Shuyan ZHANG , Federico CAPASSO
Abstract: A method of fabricating an optical device and the associated optical device are disclosed. The optical device includes a metasurface and a substrate that are integrally formed by the same materials. The method comprises: forming a photoresist mask on a substrate, the photoresist mask defining a metasurface pattern based on an optical profile of a target optical device; generating metasurface features on the substrate, by etching away a portion of the substrate that is not covered by the photoresist mask; and producing the target optical device having the metasurface features, by removing the photoresist mask, wherein the metasurface features include a portion of a material of the substrate.
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