公开(公告)号：US20210032489A1

公开(公告)日：2021-02-04

申请号：US16766432

申请日：2018-11-20

Applicant: PPG INDUSTRIES OHIO, INC.

Inventor： Paul F. CHEETHAM ,  Shawn R. DEBERRY

IPC: C09D11/52 ,  C09D11/037 ,  H05K1/09 ,  H05K3/06 ,  C23F1/02 ,  C23F1/10 ,  G06F3/044

Abstract: A patterning paste is disclosed for patterning metal nanowires, the patterning paste including a complexing agent containing guanidine thiocyanate. A method of selectively patterning a substrate having metal nanowires includes: providing a substrate having a surface bearing metal nanowires; and selectively applying the patterning paste to the substrate such that the metal nanowires are selectively cut into a pattern. A consumer electronic product includes: a substrate having a surface bearing metal nanowires. The metal nanowires of the substrate are selectively patterned by applying the patterning paste to the substrate such that the metal nanowires are selectively cut into the pattern.