公开(公告)号：US20200295211A1

公开(公告)日：2020-09-17

申请号：US16890286

申请日：2020-06-02

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Masaya HIRADE ,  Manabu NAKATA ,  Yuko KISHIMOTO ,  Hironori KAJI ,  Katsuyuki SHIZU ,  Katsuaki SUZUKI

IPC: H01L31/055 ,  C09K11/06 ,  H01L31/0232 ,  H01L51/42 ,  H01L51/00

Abstract: A photoelectric conversion material includes a compound represented by Formula (1): where, X is selected from the group consisting of a hydrogen atom, a deuterium atom, a halogen atom, an alkyl group, and a cyano group; and Y represents a monovalent substituent represented by Formula (2): where, R1 to R10 each independently represent a hydrogen atom, a deuterium atom, a halogen atom, an alkyl group, or an aryl group; or two or more of R1 to R10 bond to each other to form one or more rings, and the remainders each independently represent a hydrogen atom, a deuterium atom, a halogen atom, an alkyl group, or an aryl group; * denotes the binding site of Y in Formula (1); and Ar1 is selected from the group consisting of structures represented by Formulae (3): where ** denotes a binding site of Ar1 with N in Formula (2).

公开(公告)号：US20210265583A1

公开(公告)日：2021-08-26

申请号：US17313563

申请日：2021-05-06

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： Masaya HIRADE ,  Manabu NAKATA ,  Katsuya NOZAWA ,  Yasunori INOUE

IPC: H01L51/44 ,  H01L51/42 ,  H01L27/30 ,  H01L51/00

Abstract: A method for manufacturing a photoelectric conversion element includes providing a base structure including a semiconductor substrate having a principal surface, a first electrode located on or above the principal surface, second electrodes which are located on or above the principal surface and which are one- or two-dimensionally arranged, and a photoelectric conversion film covering at least the second electrodes; forming a mask layer on the photoelectric conversion film, the mask layer being conductive and including a covering section covering a portion of the photoelectric conversion film that overlaps the second electrodes in plan view; and partially removing the photoelectric conversion film by immersing the base structure and the mask layer in an etchant.