公开(公告)号：US11720024B2

公开(公告)日：2023-08-08

申请号：US17880761

申请日：2022-08-04

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Hikaru Tokunaga ,  Daigo Saito ,  Keisuke Hashimoto ,  Rikimaru Sakamoto

IPC: G03F7/11 ,  G03F7/40 ,  G03F7/20 ,  C08G12/26 ,  C08G16/02 ,  C09D161/26 ,  H01L21/027

CPC classification number: G03F7/11 ,  C08G12/26 ,  C08G16/0268 ,  C09D161/26 ,  G03F7/2002 ,  G03F7/2059 ,  G03F7/40 ,  H01L21/0274

Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):




wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.

公开(公告)号：US08674052B2

公开(公告)日：2014-03-18

申请号：US13734434

申请日：2013-01-04

Applicant: Nissan Chemical Industries, Ltd.

Inventor： Daigo Saito ,  Hiroaki Okuyama ,  Hideki Musashi ,  Tetsuya Shinjo ,  Keisuke Hashimoto

IPC: C08G59/40

CPC classification number: H01L21/3081 ,  C08G12/26 ,  C08G16/02 ,  C08G61/12 ,  C08G73/0273 ,  C08G73/0672 ,  C08G2261/344 ,  C08L61/26 ,  C08L79/02 ,  C08L79/04 ,  G03F7/091 ,  G03F7/094 ,  H01L21/0271

Abstract: There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula (1): wherein each of R1, R2, R3, and R5 may be a hydrogen atom, R4 may be phenyl group or naphthyl group. A resist underlayer film forming composition comprising the polymer, and a resist underlayer film formed from the composition. A high refractive index film forming composition comprising the polymer, and a high refractive index film formed from the composition.