-
公开(公告)号：US20110059399A1
公开(公告)日：2011-03-10
申请号：US12555040
申请日：2009-09-08
申请人： Moshe Levanon , Georgy Bylina , Vladimir Kampel , Marina Rubin , Larisa Postel , Tanya Kurtser , Moshe Nakash
发明人： Moshe Levanon , Georgy Bylina , Vladimir Kampel , Marina Rubin , Larisa Postel , Tanya Kurtser , Moshe Nakash
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368
摘要： Positive-working imageable elements having improved sensitivity, high resolution, and solvent resistance are prepared using a water-insoluble polymeric binder comprising vinyl acetal recurring units that have pendant hydroxyaryl groups, and recurring units comprising carboxylic acid aryl ester groups that are substituted with a cyclic imide group. These imageable elements can be imaged and developed to provide various types of elements including lithographic printing plates.
摘要翻译： 使用包含具有侧羟基芳基的乙烯基缩醛重复单元的水不溶性聚合物粘合剂制备具有改进的灵敏度，高分辨率和耐溶剂性的正性可成像元件，以及包含羧酸芳基酯基的重复单元，其被环状 酰亚胺组。 这些可成像元件可被成像和显影以提供各种类型的元件，包括平版印刷版。
-
公开(公告)号：US08298750B2
公开(公告)日：2012-10-30
申请号：US12555040
申请日：2009-09-08
申请人： Moshe Levanon , Georgy Bylina , Vladimir Kampel , Marina Rubin , Larisa Postel , Tanya Kurtser , Moshe Nakash
发明人： Moshe Levanon , Georgy Bylina , Vladimir Kampel , Marina Rubin , Larisa Postel , Tanya Kurtser , Moshe Nakash
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368
摘要： Positive-working imageable elements having improved sensitivity, high resolution, and solvent resistance are prepared using a water-insoluble polymeric binder comprising vinyl acetal recurring units that have pendant hydroxyaryl groups, and recurring units comprising carboxylic acid aryl ester groups that are substituted with a cyclic imide group. These imageable elements can be imaged and developed to provide various types of elements including lithographic printing plates.
摘要翻译： 使用包含具有侧羟基芳基的乙烯基缩醛重复单元的水不溶性聚合物粘合剂制备具有改进的灵敏度，高分辨率和耐溶剂性的正性可成像元件，以及包含羧酸芳基酯基团的重复单元，其被环状 酰亚胺组。 这些可成像元件可被成像和显影以提供各种类型的元件，包括平版印刷版。
-
3.发明授权Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s 有权含有聚（乙烯基羟基芳基羧酸酯）的辐射敏感组合物和元素公开(公告)号：US08048609B2
公开(公告)日：2011-11-01
申请号：US12339469
申请日：2008-12-19
申请人： Moshe Levanon , Georgy Bylina , Vladimir Kampel , Larisa Postel , Marina Rubin , Tanya Kurtser
发明人： Moshe Levanon , Georgy Bylina , Vladimir Kampel , Larisa Postel , Marina Rubin , Tanya Kurtser
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/24 , B41C2210/262 , G03F7/039 , Y10S430/11
摘要： A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved sensitivity and solvent resistance. These elements are useful for making lithographic printing plates and printed circuit boards. The composition includes a water-insoluble polymeric binder that has at least 20 mol % of recurring units comprising hydroxyaryl carboxylic acid ester groups, some of which can be substituted with cyclic imide moieties.
摘要翻译： 可以使用辐射敏感组合物来制备具有改善的灵敏度和耐溶剂性的正性可成像元件。 这些元素可用于制备平版印刷版和印刷电路板。 该组合物包括具有至少20摩尔％的包含羟基芳基羧酸酯基团的重复单元的水不溶性聚合物粘合剂，其中一些可以被环状酰亚胺部分取代。
-
4.发明申请RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS CONTAINING POLY(VINYL HYDROXYARYL CARBOXYLIC ACID ESTER)S 有权含有聚（乙烯基羟基羧酸酯）的辐射敏感组合物和元素公开(公告)号：US20100159390A1
公开(公告)日：2010-06-24
申请号：US12339469
申请日：2008-12-19
申请人： Moshe Levanon , Georgy Bylina , Vladimir Kampel , Larisa Postel , Marina Rubin , Tanya Kurtser
发明人： Moshe Levanon , Georgy Bylina , Vladimir Kampel , Larisa Postel , Marina Rubin , Tanya Kurtser
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/24 , B41C2210/262 , G03F7/039 , Y10S430/11
摘要： A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved sensitivity and solvent resistance. These elements are useful for making lithographic printing plates and printed circuit boards. The composition includes a water-insoluble polymeric binder that has at least 20 mol % of recurring units comprising hydroxyaryl carboxylic acid ester groups, some of which can be substituted with cyclic imide moieties.
摘要翻译： 可以使用辐射敏感组合物来制备具有改善的灵敏度和耐溶剂性的正性可成像元件。 这些元素可用于制备平版印刷版和印刷电路板。 该组合物包括具有至少20摩尔％的包含羟基芳基羧酸酯基团的重复单元的水不溶性聚合物粘合剂，其中一些可以被环状酰亚胺部分取代。
-
5.发明授权Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s 有权具有耐溶剂性聚（乙烯醇缩醛）的辐射敏感组合物和元素公开(公告)号：US07955779B2
公开(公告)日：2011-06-07
申请号：US12545297
申请日：2009-08-21
申请人： Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
发明人： Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
IPC分类号： G03F7/004
CPC分类号： B41M5/368 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/033 , Y10S430/12 , Y10S430/121
摘要： A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
摘要翻译： 可以使用辐射敏感组合物来制备具有改进的耐溶剂性的正性可成像元件，并且可用于制备平版印刷版。 该组合物包括碱性可溶性聚合物粘合剂，其是表现出对压制化学品的改善的抗性的特定聚（乙烯醇缩醛）和辐射吸收化合物。
-
公开(公告)号：US20090004599A1
公开(公告)日：2009-01-01
申请号：US11769766
申请日：2007-06-28
申请人： Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
发明人： Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
CPC分类号： B41M5/368 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/033 , Y10S430/12 , Y10S430/121
摘要： A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
-
7.发明授权Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s 有权具有耐溶剂性聚（乙烯醇缩醛）的辐射敏感组合物和元素公开(公告)号：US07723012B2
公开(公告)日：2010-05-25
申请号：US11769766
申请日：2007-06-28
申请人： Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
发明人： Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
CPC分类号： B41M5/368 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/033 , Y10S430/12 , Y10S430/121
摘要： A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
摘要翻译： 可以使用辐射敏感组合物来制备具有改进的耐溶剂性的正性可成像元件，并且可用于制备平版印刷版。 该组合物包括碱性可溶性聚合物粘合剂，其是表现出对压制化学品的改善的抗性的特定聚（乙烯醇缩醛）和辐射吸收化合物。
-
8.发明申请RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTANT POLY(VINYL ACETAL)S 有权辐射敏感组合物和耐溶剂聚（乙烯醇）S的元素公开(公告)号：US20090311626A1
公开(公告)日：2009-12-17
申请号：US12545297
申请日：2009-08-21
申请人： Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
发明人： Moshe Levanon , Emmanuel Lurie , Vladimir Kampel
CPC分类号： B41M5/368 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/033 , Y10S430/12 , Y10S430/121
摘要： A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
摘要翻译： 可以使用辐射敏感组合物来制备具有改进的耐溶剂性的正性可成像元件，并且可用于制备平版印刷版。 该组合物包括碱性可溶性聚合物粘合剂，其是表现出对压制化学品的改善的抗性的特定聚（乙烯醇缩醛）和辐射吸收化合物。
-
-
-
-
-
-
-
搜索结果
8 条记录 (耗时 0.026 秒)
