公开(公告)号：US06998442B2

公开(公告)日：2006-02-14

申请号：US10702977

申请日：2003-11-06

申请人： Min-Ho Jung ,  Jae-Chang Jung ,  Geun-Su Lee ,  Ki-Soo Shin

发明人： Min-Ho Jung ,  Jae-Chang Jung ,  Geun-Su Lee ,  Ki-Soo Shin

IPC分类号： C08L33/14

CPC分类号： G03F7/091 ,  C08F212/14 ,  C08F220/28

摘要： An organic anti-reflective polymer which prevents back reflection of lower film layers and eliminates standing wave that is occurred by a thickness change of photoresist and light, in a process for fabricating ultrafine patterns that use photoresist for lithography by using 193 nm ArF and its preparation method. More particularly, the organic anti-reflective polymer of the present invention is useful for fabricating ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices. A composition containing such organic anti-reflective polymer, an anti-reflective coating layer made therefrom and a preparation method thereof.

公开(公告)号：US07235349B2

公开(公告)日：2007-06-26

申请号：US11321126

申请日：2005-12-29

申请人： Sung Koo Lee ,  Jae Chang Jung ,  Geun Su Lee ,  Ki-Soo Shin

发明人： Sung Koo Lee ,  Jae Chang Jung ,  Geun Su Lee ,  Ki-Soo Shin

IPC分类号： G03F7/00 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  G03F7/40

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/091 ,  Y10S430/114 ,  Y10S430/119 ,  Y10S430/12 ,  Y10S430/151

摘要： A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order to prevent formation of sloping patterns due to photoresist resins absorbing wavelength of light used as light sources during lithography process using light sources such as KrF, ArF, VUV, EUV, E-beam and ion beam, even when photoresist resins having high absorbance to light source are used.

摘要翻译： 使用含酸产生器的底部抗反射涂层形成超细纹图案的方法。 更具体地，涉及使用含有过量酸产生剂的有机底部防反射涂层形成垂直图案的方法，以便防止在使用光源的光刻工艺期间吸收用作光源的光的波长的光致抗蚀剂树脂形成倾斜图案 例如KrF，ArF，VUV，EUV，电子束和离子束，即使使用对光源具有高吸光度的光致抗蚀剂树脂。

公开(公告)号：US07205089B2

公开(公告)日：2007-04-17

申请号：US10989221

申请日：2004-11-15

申请人： Jae-chang Jung ,  Cheol-Kyu Bok ,  Seung Chan Moon ,  Ki-Soo Shin

发明人： Jae-chang Jung ,  Cheol-Kyu Bok ,  Seung Chan Moon ,  Ki-Soo Shin

IPC分类号： G03C1/835 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38 ,  C08F16/34

CPC分类号： G03F7/091 ,  C08F8/00 ,  C08F216/34 ,  C08F2810/20 ,  C08F116/34

摘要： A cross-linking polymer for an organic anti-reflective coating that is able to improve the uniformity of an ultra-fine photoresist pattern formed using a photolithography process and an ArF light source with 194 nm wavelength. Organic anti-reflective coatings including the same and a method for forming a photoresist pattern using the same are also disclosed. The disclosed cross-linking polymer is capable of preventing scattered reflection from a bottom film layer, eliminating standing wave effect due to alteration of thickness of the photoresist film, and increasing uniformity of the thickness of photoresist pattern. At the same time, the disclosed cross-linking pattern increases the etching velocity of the organic anti-reflective coating so that it can be easily removed.

摘要翻译： 用于有机抗反射涂层的交联聚合物，其能够提高使用光刻工艺形成的超细光致抗蚀剂图案的均匀性和具有194nm波长的ArF光源。 还公开了包括其的有机抗反射涂层和使用其的形成光致抗蚀剂图案的方法。 所公开的交联聚合物能够防止底部膜层的散射反射，消除由于光致抗蚀剂膜的厚度变化引起的驻波效应，并增加光致抗蚀剂图案的厚度的均匀性。 同时，所公开的交联图案增加了有机抗反射涂层的蚀刻速度，使得其可以容易地去除。

公开(公告)号：US09077063B2

公开(公告)日：2015-07-07

申请号：US13467886

申请日：2012-05-09

申请人： Dong-Wan Chun ,  Jae-Won Jang ,  Ki-Soo Shin

发明人： Dong-Wan Chun ,  Jae-Won Jang ,  Ki-Soo Shin

IPC分类号： H01P1/20 ,  H01P7/10 ,  H01P1/208 ,  H01P1/201

CPC分类号： H01P1/2086 ,  H01P1/201 ,  H01P7/105

摘要： A multi-mode filter for realizing wide-band is disclosed. The multi-mode filter includes a housing; a plurality of cavities formed in the housing; a plurality of resonators located in each of the cavities; at least one connector formed through a side wall of the housing; and at least one coupling element connected to the at least one connector in the cavities, the at least one coupling element coupling the at least one connector with at least one of the resonators respectively, wherein each of the at least one coupling element has “T” shape in view of front section and “L” shape in view of side section.

摘要翻译： 公开了一种用于实现宽带的多模式滤波器。 多模式过滤器包括壳体; 形成在所述壳体中的多个空腔; 位于每个空腔中的多个谐振器; 通过所述壳体的侧壁形成的至少一个连接器; 以及至少一个耦合元件，其连接到所述空腔中的所述至少一个连接器，所述至少一个耦合元件分别将所述至少一个连接器与所述谐振器中的至少一个耦合，其中所述至少一个耦合元件中的每一个具有“T 从侧面看前视图的形状和“L”形。

公开(公告)号：US09184479B2

公开(公告)日：2015-11-10

申请号：US13474435

申请日：2012-05-17

申请人： Dong-Wan Chun ,  Jae-Wong Jang ,  Ki-Soo Shin

发明人： Dong-Wan Chun ,  Jae-Wong Jang ,  Ki-Soo Shin

IPC分类号： H01P1/208 ,  H01P7/10 ,  H01P7/06

CPC分类号： H01P1/2086 ,  H01P1/2084 ,  H01P7/06 ,  H01P7/105

摘要： A multi-mode filter for realizing wide band using capacitive coupling and inductive coupling and capable of tuning coupling value is disclosed. The multi-mode filter includes a housing; a first cavity and a second cavity formed in the housing; a first resonator located in the first cavity, a second resonator located in the second cavity, a wall configured to separate the first cavity from the second cavity; and a first coupling element, wherein a groove is formed between the housing and the wall, the first coupling element is inserted in the groove in crossing direction to the wall, one part of the first coupling element is disposed in the first cavity, another part of the first coupling element is disposed in the second cavity, and the first coupling element is connected to a ground.

摘要翻译： 公开了一种使用电容耦合和电感耦合实现宽带并能够调谐耦合值的多模滤波器。 多模式过滤器包括壳体; 在壳体中形成的第一腔和第二腔; 位于第一空腔中的第一谐振器，位于第二空腔中的第二谐振器，被配置为将第一空腔与第二空腔分离的壁; 以及第一联接元件，其中在所述壳体和所述壁之间形成有凹槽，所述第一联接元件在与所述壁交叉的方向上插入所述凹槽中，所述第一联接元件的一部分设置在所述第一腔体中， 第一耦合元件设置在第二空腔中，并且第一耦合元件连接到地面。