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    Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
    7.
    发明申请
    Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物

    公开(公告)号：US20080086014A1

    公开(公告)日：2008-04-10

    申请号：US11889596

    申请日：2007-08-15

    申请人： Junji Shigematsu ,  Isao Yoshida ,  Yukako Harada ,  Masumi Suetsugu

    发明人： Junji Shigematsu ,  Isao Yoshida ,  Yukako Harada ,  Masumi Suetsugu

    IPC分类号： C07C303/02

    CPC分类号： C07C309/17 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D313/06 ,  C07D333/46 ,  C07D335/00 ,  G03F7/0045 ,  G03F7/0397

    摘要： The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH2— in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH2— in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.

    摘要翻译： 本发明提供由式（I）表示的盐：其中X表示在C 3中含有至少一个二价脂环族烃基的C 3 -C 30二价基团和至少一个-CH 2 - -C30二价基团可以被-O-或-CO-取代，Y表示可被至少一个选自C 1 -C 6烷氧基，C 1 -C 4全氟烷基，C 1 -C 4烷氧基， C 3 -C 30环烃基中的C 1 -C 6羟基烷基，羟基和氰基以及至少一个-CH 2 - 可以被-O-或-CO-取代， Q 1和Q 2各自独立地表示氟原子或C 1 -C 6全氟烷基，并且A H +表示有机抗衡离子。

    Positive resist composition
    8.
    发明授权
    Positive resist composition 有权
    正抗蚀剂组成

    公开(公告)号：US07144674B2

    公开(公告)日：2006-12-05

    申请号：US10390903

    申请日：2003-03-19

    申请人： Katsuhiko Namba ,  Masumi Suetsugu ,  Koshiro Ochiai

    发明人： Katsuhiko Namba ,  Masumi Suetsugu ,  Koshiro Ochiai

    IPC分类号： G03C1/73 ,  G03F7/039

    CPC分类号： G03F7/0392 ,  G03F7/0397 ,  Y10S430/106

    摘要： The present invention provides a positive resist composition comprising (A) at least one resin selected from the group consisting of {circle around (1)} resin which is itself insoluble or poorly soluble in an alkali aqueous solution but cause a chemical change by the action of an acid to become soluble in an alkali aqueous solution with a proviso that the resin is not novolak resin and {circle around (2)} alkali-soluble resin, (B) novolak resin containing protective group which can be dissociated by the action of an acid and (C) an acid generator.

    摘要翻译： 本发明提供了一种正型抗蚀剂组合物，其包含（A）至少一种选自以下的树脂：圆周（1个树脂本身不溶于或难溶于碱水溶液，但通过 酸溶解在碱性水溶液中，条件是树脂不是酚醛清漆树脂和{圆周（2碱溶性树脂，（B）含有保护基的酚醛清漆树脂，其可以通过酸的作用解离和（ C）酸产生器。

    Resist composition
    9.
    发明授权
    Resist composition 失效
    抗蚀组成

    公开(公告)号：US06689531B2

    公开(公告)日：2004-02-10

    申请号：US10228190

    申请日：2002-08-27

    申请人： Sang Tae Kim ,  Seung Jin Kang ,  Shi Jin Sung ,  Masumi Suetsugu ,  Airi Yamada

    发明人： Sang Tae Kim ,  Seung Jin Kang ,  Shi Jin Sung ,  Masumi Suetsugu ,  Airi Yamada

    IPC分类号： G03F7023

    CPC分类号： C08K5/0008 ,  C08L61/06

    摘要： A resist composition showing excellent close adherence at the interface of a substrate and a resist, improving problems in wet etching, having excellent sensitivity and resolution, and also showing excellent resist performances, and comprising a compound of the general formula (I): wherein, R1 and R2 represent each independently a hydrogen atom or an alkyl group, R3 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, alkenyl group, alkylcarbonyl group, arylcarbonyl group or aralkylcarbonyl group, n represents an integer of 1 to 40, m represents an integer of 1 to 5, and l represents an integer of 1 to 5, is provided.

    摘要翻译： 在基板和抗蚀剂的界面上显示优异的紧密附着性的抗蚀剂组合物，改善了湿蚀刻中的问题，灵敏度和分辨率优异，抗蚀性能优异，并且包含通式（I）的化合物：其中， R 1和R 2各自独立地表示氢原子或烷基，R 3表示氢原子，烷基，芳基，芳烷基，烯基，烷基羰基，芳基羰基或芳烷基羰基， n表示1〜40的整数，m表示1〜5的整数，l表示1〜5的整数。

    Developer preparing apparatus and developer preparing method
    10.
    发明授权
    Developer preparing apparatus and developer preparing method 失效
    显影剂制备装置和显影剂制备方法

    公开(公告)号：US5476320A

    公开(公告)日：1995-12-19

    申请号：US338222

    申请日：1994-11-09

    申请人： Satoshi Taguchi ,  Masumi Suetsugu ,  Tsutomu Nagase ,  Norikazu Nakagawa

    发明人： Satoshi Taguchi ,  Masumi Suetsugu ,  Tsutomu Nagase ,  Norikazu Nakagawa

    IPC分类号： G03F7/30 ,  B01F15/04

    CPC分类号： G03F7/30 ,  Y10T137/0329

    摘要： A developer preparing apparatus for obtaining a developer containing a developer component having a definite content by mixing an undiluted developer solution containing 5 to 40% by weight of tetramethylammonium hydroxide (TMAH) and pure water, and a developer preparing method for preparing the developer using the developer preparing apparatus. The developer preparing apparatus comprising a mixing bath equipped with a means for receiving and mixing an undiluted developer solution and pure water, an ultrasonic densitometer for measuring the developer component contained in the developer in the mixing bath, a flow rate controlling means for controlling the supplying flow rate of the undiluted developer solution and/or pure water into the mixing bath by the output signal from the ultrasonic densitometer, and a storage tank for receiving and storing the developer containing the developer component having the definite content in the mixing bath.

    摘要翻译： 一种显影剂制备装置，用于通过混合含有5〜40重量％的四甲基氢氧化铵（TMAH）和纯水的未稀释的显影液，得到含有具有确定含量的显影剂成分的显影剂和显影剂的制备方法， 显影剂制备装置。 该显影剂制备装置包括配备有用于接收和混合未稀释的显影剂溶液和纯水的装置的混合浴，用于测量混合浴中显影剂中所含的显影剂成分的超声波密度计，用于控制供给的流量控制装置 通过来自超声波密度计的输出信号将未稀释的显影剂溶液和/或纯水流入混合槽中的流速;以及储存罐，用于接收和储存含有在混合槽中具有确定含量的显影剂组分的显影剂。