公开(公告)号：US20170158809A1

公开(公告)日：2017-06-08

申请号：US15355267

申请日：2016-11-18

Applicant: Massachusetts Institute of Technology

Inventor： Karen K. Gleason ,  Minghui Wang ,  Nicolas D. Boscher ,  Patrick Choquet

IPC: C08G61/12 ,  B05D1/00 ,  C23C16/505

CPC classification number: C08G61/124 ,  B01D53/228 ,  B01D67/0037 ,  B01D67/0072 ,  B01D69/127 ,  B01D69/148 ,  B01D71/00 ,  B01D2323/30 ,  B05D1/62 ,  C01B3/503 ,  C01B13/0255 ,  C01B21/04 ,  C01B21/0444 ,  C08F34/00 ,  C08F134/00 ,  C08F234/00 ,  C08G2261/228 ,  C08G2261/312 ,  C08G2261/3241 ,  C08G2261/37 ,  C08G2261/61 ,  C08J5/2231 ,  C08J7/047 ,  C08J2343/04 ,  C08J2445/00 ,  C09D145/00 ,  C23C16/505

Abstract: Described herein are facile, one-step initiated plasma enhanced chemical vapor deposition (iPECVD) methods of synthesizing hyper-thin (e.g., sub-100 nm) and flexible metal organic covalent network (MOCN) layers. As an example, the MOCN may be made from zinc tetraphenylporphyrin (ZnTPP) building units. When deposited on a membrane support, the MOCN layers demonstrate gas separation exceeding the upper bounds for multiple gas pairs while reducing the flux as compared to the support alone.

公开(公告)号：US10155843B2

公开(公告)日：2018-12-18

申请号：US15355267

申请日：2016-11-18

Applicant: Massachusetts Institute of Technology ,  Luxembourg Institute of Science and Technology

Inventor： Karen K. Gleason ,  Minghui Wang ,  Nicolas D. Boscher ,  Patrick Choquet

IPC: C08G61/12 ,  C23C16/505 ,  B05D1/00 ,  B01D69/12 ,  C01B3/50 ,  C08F34/00 ,  C08F134/00 ,  C08J5/22 ,  C08F234/00 ,  C09D145/00 ,  B01D53/22 ,  B01D67/00 ,  B01D69/14 ,  B01D71/00 ,  C01B21/04 ,  C01B13/02

Abstract: Described herein are facile, one-step initiated plasma enhanced chemical vapor deposition (iPECVD) methods of synthesizing hyper-thin (e.g., sub-100 nm) and flexible metal organic covalent network (MOCN) layers. As an example, the MOCN may be made from zinc tetraphenylporphyrin (ZnTPP) building units. When deposited on a membrane support, the MOCN layers demonstrate gas separation exceeding the upper bounds for multiple gas pairs while reducing the flux as compared to the support alone.