Apparatus and methods for curved focal plane array

    公开(公告)号:US11063073B2

    公开(公告)日:2021-07-13

    申请号:US16487945

    申请日:2018-02-23

    摘要: A method of fabricating a curved focal plane array (FPA) includes forming an epitaxial layer including a semiconductor on a release layer. The release layer includes a two-dimensional (2D) material and is disposed on a first substrate. The method also includes forming a metal layer on the epitaxial layer and transferring the epitaxial layer and the metal layer to a second substrate including an elastomer. The method also includes fabricating a plurality of photodetectors from the epitaxial layer and bending the second substrate to form the curved FPA.

    APPARATUS AND METHODS FOR CURVED FOCAL PLANE ARRAY

    公开(公告)号:US20190386044A1

    公开(公告)日:2019-12-19

    申请号:US16487945

    申请日:2018-02-23

    摘要: A method of fabricating a curved focal plane array (FPA) includes forming an epitaxial layer including a semiconductor on a release layer. The release layer includes a two-dimensional (2D) material and is disposed on a first substrate. The method also includes forming a metal layer on the epitaxial layer and transferring the epitaxial layer and the metal layer to a second substrate including an elastomer. The method also includes fabricating a plurality of photodetectors from the epitaxial layer and bending the second substrate to form the curved FPA.

    SYSTEMS AND METHODS OF DISLOCATION FILTERING FOR LAYER TRANSFER

    公开(公告)号:US20190259608A1

    公开(公告)日:2019-08-22

    申请号:US16348125

    申请日:2017-11-08

    摘要: A method of manufacturing a semiconductor device includes forming a first epitaxial layer on a first substrate. The first substrate includes a first semiconductor material having a first lattice constant and the first epitaxial layer includes a second semiconductor material having a second lattice constant different from the first lattice constant. The method also includes disposing a graphene layer on the first epitaxial layer and forming a second epitaxial layer comprising the second semiconductor material on the graphene layer. This method can increase the substrate reusability, increase the release rate of functional layers, and realize precise control of release thickness.

    Systems and methods of dislocation filtering for layer transfer

    公开(公告)号:US10903073B2

    公开(公告)日:2021-01-26

    申请号:US16348125

    申请日:2017-11-08

    摘要: A method of manufacturing a semiconductor device includes forming a first epitaxial layer on a first substrate. The first substrate includes a first semiconductor material having a first lattice constant and the first epitaxial layer includes a second semiconductor material having a second lattice constant different from the first lattice constant. The method also includes disposing a graphene layer on the first epitaxial layer and forming a second epitaxial layer comprising the second semiconductor material on the graphene layer. This method can increase the substrate reusability, increase the release rate of functional layers, and realize precise control of release thickness.