Thermal management system for highly transient pulsed high-heat-flux loads

    公开(公告)号:US12130060B1

    公开(公告)日:2024-10-29

    申请号:US17809673

    申请日:2022-06-29

    IPC分类号: F25B41/20 F25B49/02

    摘要: A vapor compression system control implementations that maintain surface temperature uniformity of at least one cold plate throughout pulsed thermal loads from a minimal or zero load state suddenly to a high or 100% of design capacity state where the heat pulse occurrence, frequency, and durations are not known a priori. Vapor compression system control implementations that maintain surface temperature uniformity of at least one cold plate throughout pulsed thermal loads from a minimal or zero load state suddenly to a high or 100% of design capacity state where the heat pulse occurrence, frequency, and durations are not known a priori. Rapid thermal pulse applications require a robust control strategy of the cold plate assembly to maintain cold plate surface temperature uniformity. In one implementation, a control system for the cold plate assembly that maintains a uniform cold plate temperature given controlled supply and suction conditions is contemplated.